Device Placement Optimization Based on Sequential Q-Learning Using Local Layout Effect Surrogate Models

An automatic methodology is proposed to optimize analog device placement using reinforcement learning (RL). Device characteristics are influenced by local layout effects and the process node used; hence, physical layout information from post-layout simulation acts as the input for an artificial neural network (ANN). Trained ANNs can be implemented as surrogate models for length of diffusion and deep trench isolation, which are integrated into the reward functions of the learning agent. The Q-learning method is employed for RL. The proposed method emulates design expert expertise by sequentially applying multiple Q-learning with selected reward functions. This approach effectively completes local layout effect-aware automated placement in the early setup stage of advanced process nodes, even with limited design knowledge. Finally, two fundamental analog circuits, the folded cascode operational transconductance amplifier and comparator, are employed to demonstrate the method’s ability to achieve zero threshold voltage variation under local layout effects using dummy transistors and guard rings while maintaining area efficiency.

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Publication Details

Journal
JSTS Journal of Semiconductor Technology and Science
Published
2025-02-28
DOI
https://doi.org/10.5573/jsts.2025.25.1.82
Primary Topic
Industrial Vision Systems and Defect Detection
Type
article
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article

Device Placement Optimization Based on Sequential Q-Learning Using Local Layout Effect Surrogate Models

KyeongJin Kang, SoYoung Kim
JSTS Journal of Semiconductor Technology and Science
Industrial Vision Systems and Defect Detection
article

Device Placement Optimization Based on Sequential Q-Learning Using Local Layout Effect Surrogate Models

KyeongJin Kang, SoYoung Kim
article en

Abstract

An automatic methodology is proposed to optimize analog device placement using reinforcement learning (RL). Device characteristics are influenced by local layout effects and the process node used; hence, physical layout information from post-layout simulation acts as the input for an artificial neural network (ANN). Trained ANNs can be implemented as surrogate models for length of diffusion and deep trench isolation, which are integrated into the reward functions of the learning agent. The Q-learning method is employed for RL. The proposed method emulates design expert expertise by sequentially applying multiple Q-learning with selected reward functions. This approach effectively completes local layout effect-aware automated placement in the early setup stage of advanced process nodes, even with limited design knowledge. Finally, two fundamental analog circuits, the folded cascode operational transconductance amplifier and comparator, are employed to demonstrate the method’s ability to achieve zero threshold voltage variation under local layout effects using dummy transistors and guard rings while maintaining area efficiency.

JSTS Journal of Semiconductor Technology and ScienceVol. 25(1)
Openalex Percentile: Top 95%
Industrial Vision Systems and Defect Detection
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Device Placement Optimization Based on Sequential Q-Learning Using Local Layout Effect Surrogate Models — KyeongJin Kang, SoYoung Kim · JSTS Journal of Semiconductor Technology and Science (2025) | TGRS Research Map | TGRS