Research on the current research status and future development trend of extreme ultraviolet

Extreme Ultraviolet (EUV) lithography is pivotal in semiconductor manufacturing and attosecond metrology. This paper delves into the current research status and future development trends of EUV, aiming to offer a comprehensive understanding and predictions for this technologys evolution. Considering the challenges in applying EUV in chip manufacture, we will discuss advanced methods such as metalenses, phase-shifting masks, EUV transient grating spectroscopy, and negative tone development (NTD) processes to address issues in photolithography. Additionally, this article employs a methodical literature review and analysis. Presently, EUV lithography machines with a numerical aperture (NA) of 0.33 have achieved mass production of 5nm logic chips. Nevertheless, generating a more stable EUV light source and enhancing the focusing ability and power of the light source remain critical challenges requiring resolution.