Confirming correctness of procedure for determining soft parameters in Coulomb potential of noble atoms

This paper verifies that the procedure described in [Computer Physics Communications, 276, 108372 (2022)] for determining the soft parameters in the Coulomb potential of noble atoms is accurate via the modification of the initial position value of x0 and the parameter b range. In the case of nonsequential double ionization (NSDI), the results demonstrate that the value of x0 is not contingent upon the range of computed parameter a. Furthermore, we examine the significance of parameter b in the NSDI process and conclude that the ideal value for the soft Coulomb parameter of b is that b ≤ 0.1 a.u.

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Publication Details

Journal
HUE UNIVERSITY JOURNAL OF SCIENCE NATURAL SCIENCE
Published
2024-12-31
DOI
https://doi.org/10.26459/hueunijns.v133i1d.7451
Primary Topic
Surface and Thin Film Phenomena
Type
article
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article

Confirming correctness of procedure for determining soft parameters in Coulomb potential of noble atoms

Bernard Y. Ho, Thu D. H. Truong, Tai V.
HUE UNIVERSITY JOURNAL OF SCIENCE NATURAL SCIENCE
Surface and Thin Film Phenomena
article

Confirming correctness of procedure for determining soft parameters in Coulomb potential of noble atoms

Bernard Y. Ho, Thu D. H. Truong, Tai V.
article en

Abstract

This paper verifies that the procedure described in [Computer Physics Communications, 276, 108372 (2022)] for determining the soft parameters in the Coulomb potential of noble atoms is accurate via the modification of the initial position value of x0 and the parameter b range. In the case of nonsequential double ionization (NSDI), the results demonstrate that the value of x0 is not contingent upon the range of computed parameter a. Furthermore, we examine the significance of parameter b in the NSDI process and conclude that the ideal value for the soft Coulomb parameter of b is that b ≤ 0.1 a.u.

HUE UNIVERSITY JOURNAL OF SCIENCE NATURAL SCIENCEVol. 133(1D)
Ho Chi Minh City University of Education (VN)
Openalex Percentile: Top 76%
Surface and Thin Film Phenomena
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