Advancing Glass Engineering: Harnessing Focused Electron Beams for Direct Microstructuring

A technological approach for direct glass structuring is presented by exploiting electron-beam-induced defect generation utilizing a conventional scanning electron microscope (SEM). The structuring process is assumed to be linked to electron-beam-induced ion migration and allows to create structures of several hundred nanometers in depth. It is demonstrated that the structuring can be realized in literally any SEM, which thus enables a comparatively simple implementation in support of a broad field of applications. The experiments are realized using electron energies of 5 to 15 keV in combination with different kinds of glasses, such as fused silica and ultra-low expansion glass, that are equipped with a charge dissipation top-layer. By controlling the beam trajectory at the surface and the electron beam parameters, freeform structuring, structure arrays, direct embedding of metal structures into the glass surface, and beam-defined three-level patterning are realized. The shown electron beam-based glass structuring extends therefore the current possibilities in a complementary manner, enabling further fabrication strategies and direct structuring even of fragile, 3D-structured surfaces.

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Publication Details

Journal
Small Methods
Published
2025-03-09
DOI
https://doi.org/10.1002/smtd.202401671
Primary Topic
Integrated Circuits and Semiconductor Failure Analysis
Type
article
Field-Weighted Citation Impact
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article

Advancing Glass Engineering: Harnessing Focused Electron Beams for Direct Microstructuring

Mathias Holz, Steffen Strehle, C. Weigel, Martin Hofmann
Small Methods
Integrated Circuits and Semiconductor Failure Analysis
article

Advancing Glass Engineering: Harnessing Focused Electron Beams for Direct Microstructuring

Mathias Holz, Steffen Strehle, C. Weigel, Martin Hofmann
article en

Abstract

A technological approach for direct glass structuring is presented by exploiting electron-beam-induced defect generation utilizing a conventional scanning electron microscope (SEM). The structuring process is assumed to be linked to electron-beam-induced ion migration and allows to create structures of several hundred nanometers in depth. It is demonstrated that the structuring can be realized in literally any SEM, which thus enables a comparatively simple implementation in support of a broad field of applications. The experiments are realized using electron energies of 5 to 15 keV in combination with different kinds of glasses, such as fused silica and ultra-low expansion glass, that are equipped with a charge dissipation top-layer. By controlling the beam trajectory at the surface and the electron beam parameters, freeform structuring, structure arrays, direct embedding of metal structures into the glass surface, and beam-defined three-level patterning are realized. The shown electron beam-based glass structuring extends therefore the current possibilities in a complementary manner, enabling further fabrication strategies and direct structuring even of fragile, 3D-structured surfaces.

Small MethodsVol. 9(5)
Technische Universität Ilmenau (DE)
Openalex Percentile: Top 97%
Integrated Circuits and Semiconductor Failure Analysis
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Advancing Glass Engineering: Harnessing Focused Electron Beams for Direct Microstructuring — Mathias Holz, Steffen Strehle, et al. · Small Methods (2025) | TGRS Research Map | TGRS