Advancing Glass Engineering: Harnessing Focused Electron Beams for Direct Microstructuring
A technological approach for direct glass structuring is presented by exploiting electron-beam-induced defect generation utilizing a conventional scanning electron microscope (SEM). The structuring process is assumed to be linked to electron-beam-induced ion migration and allows to create structures of several hundred nanometers in depth. It is demonstrated that the structuring can be realized in literally any SEM, which thus enables a comparatively simple implementation in support of a broad field of applications. The experiments are realized using electron energies of 5 to 15 keV in combination with different kinds of glasses, such as fused silica and ultra-low expansion glass, that are equipped with a charge dissipation top-layer. By controlling the beam trajectory at the surface and the electron beam parameters, freeform structuring, structure arrays, direct embedding of metal structures into the glass surface, and beam-defined three-level patterning are realized. The shown electron beam-based glass structuring extends therefore the current possibilities in a complementary manner, enabling further fabrication strategies and direct structuring even of fragile, 3D-structured surfaces.
Authors
- Mathias Holz (ORCID: https://orcid.org/0000-0003-4526-5726)
- Steffen Strehle (ORCID: https://orcid.org/0000-0002-1261-2894)
- C. Weigel (ORCID: https://orcid.org/0000-0003-2167-1041)
- Martin Hofmann
Institutions
- Technische Universität Ilmenau (DE)
Publication Details
- Journal
- Small Methods
- Published
- 2025-03-09
- DOI
- https://doi.org/10.1002/smtd.202401671
- Primary Topic
- Integrated Circuits and Semiconductor Failure Analysis
- Type
- article
- Field-Weighted Citation Impact
- 0.00