Characteristics of Crystal Defects in AlGaN/GaN HEMTs at Low Temperature

In this study, we observed changes in the characteristics of the crystal defects in the crystal layers forming aluminum gallium nitride/gallium nitride high electron mobility transistors at low temperatures. A kink phenomenon was observed in the IV characteristics as the temperature decreased. Moreover, the current gain increased as the temperature decreased. Furthermore, the parasitic capacitance showed a similar temperature characteristic. The mode in which crystal defects capture carriers can be explained by a switch in the transport phenomenon from the induction of carriers to crystal defects triggered by carrier capture, rather than by two-dimensional electron gas depletion.

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Published
2024-12-01
DOI
https://doi.org/10.1109/tencon61640.2024.10902944
Citations
1
Primary Topic
GaN-based semiconductor devices and materials
Type
article
Field-Weighted Citation Impact
0.31
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Characteristics of Crystal Defects in AlGaN/GaN HEMTs at Low Temperature

Haruki Hayashi, Kento Kondo, Hirohisa Taguchi
1 citations
GaN-based semiconductor devices and materials
0.31
article

Characteristics of Crystal Defects in AlGaN/GaN HEMTs at Low Temperature

Haruki Hayashi, Kento Kondo, Hirohisa Taguchi
article en
1 citations

Abstract

In this study, we observed changes in the characteristics of the crystal defects in the crystal layers forming aluminum gallium nitride/gallium nitride high electron mobility transistors at low temperatures. A kink phenomenon was observed in the IV characteristics as the temperature decreased. Moreover, the current gain increased as the temperature decreased. Furthermore, the parasitic capacitance showed a similar temperature characteristic. The mode in which crystal defects capture carriers can be explained by a switch in the transport phenomenon from the induction of carriers to crystal defects triggered by carrier capture, rather than by two-dimensional electron gas depletion.

Chukyo University (JP)
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GaN-based semiconductor devices and materials
0.31
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