Characteristics of Crystal Defects in AlGaN/GaN HEMTs at Low Temperature
In this study, we observed changes in the characteristics of the crystal defects in the crystal layers forming aluminum gallium nitride/gallium nitride high electron mobility transistors at low temperatures. A kink phenomenon was observed in the IV characteristics as the temperature decreased. Moreover, the current gain increased as the temperature decreased. Furthermore, the parasitic capacitance showed a similar temperature characteristic. The mode in which crystal defects capture carriers can be explained by a switch in the transport phenomenon from the induction of carriers to crystal defects triggered by carrier capture, rather than by two-dimensional electron gas depletion.
Authors
- Haruki Hayashi
- Kento Kondo
- Hirohisa Taguchi
Institutions
- Chukyo University (JP)
Publication Details
- Published
- 2024-12-01
- DOI
- https://doi.org/10.1109/tencon61640.2024.10902944
- Citations
- 1
- Primary Topic
- GaN-based semiconductor devices and materials
- Type
- article
- Field-Weighted Citation Impact
- 0.31