Tunneling-barrier-controlled sensitive deep ultraviolet photodetectors based on van der Waals heterostructures

Deep ultraviolet (DUV) photodetection usually relies on wide-bandgap semiconductors, which however face challenges in material growth and doping processes. In this work, we proposed and validated a photodetection scheme based on tunneling barrier modulation, achieving highly sensitive DUV photodetection. Using a two-dimensional van der Waals heterostructure, the device integrates MoS<sub>2</sub> as the transporting layer for its high carrier mobility and low dark current, few-layered graphene (FLG) as the photon absorption layer, and hexagonal boron nitride (hBN) as the dielectric barrier. The device exhibits an photoresponsivity of 4.4 × 10<sup>6 </sup>A·W<sup>-1</sup> and specific detectivity of 1.4 × 10<sup>17</sup> <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"><mml:mi>cm</mml:mi> <mml:mo>⋅</mml:mo> <mml:msup><mml:mrow><mml:mi>H</mml:mi> <mml:mi>z</mml:mi></mml:mrow> <mml:mrow><mml:mo>-</mml:mo> <mml:mn>1</mml:mn> <mml:mo>/</mml:mo> <mml:mn>2</mml:mn></mml:mrow> </mml:msup> <mml:mo>⋅</mml:mo> <mml:msup><mml:mrow><mml:mi>W</mml:mi></mml:mrow> <mml:mrow><mml:mo>-</mml:mo> <mml:mn>1</mml:mn></mml:mrow> </mml:msup> </mml:math> for 250 nm DUV light, with a rejection ratio R<sub>250</sub>/R<sub>450</sub> exceeding 10<sup>6</sup> for visible light. Unlike conventional photodetectors, the cutoff wavelength is determined by the tunneling barrier rather than the material bandgap. Additionally, this photodetection scheme has been extended to a wide range of materials, utilizing different charge transporting layer (e.g., MoS<sub>2</sub>, ReS<sub>2</sub>), barrier layer (e.g., hBN, Al<sub>2</sub>O<sub>3</sub>), and photon absorption materials (e.g., FLG, PdSe<sub>2</sub>, Au, Pd), showcasing its broad adaptability and potential for extensive application. Furthermore, the device has been successfully employed as a power meter for weak UV radiation (0.1 μW·cm<sup>-2</sup>) and for measuring solar UV irradiance with results matching the meteorological agency's weather reports. Overall, this work introduces an effective approach for developing high-performance DUV photodetectors, highlighting significant potential for applications in the optoelectronic market.

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Publication Details

Journal
Nature Communications
Published
2025-03-05
DOI
https://doi.org/10.1038/s41467-025-56886-8
Citations
36
Primary Topic
2D Materials and Applications
Type
article
Field-Weighted Citation Impact
18.64

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article

Tunneling-barrier-controlled sensitive deep ultraviolet photodetectors based on van der Waals heterostructures

Hai Huang, Wu Shi, Jinhan Hu, Xiaosheng Fang et al.
36 citations
Nature Communications
2D Materials and Applications
18.64
article

Tunneling-barrier-controlled sensitive deep ultraviolet photodetectors based on van der Waals heterostructures

Hai Huang, Wu Shi, Jinhan Hu, Xiaosheng Fang, Junhao Chu, Yu Zhuang, Ziqing Li, Jianfeng Li, Shiyou Chen, Yan Chen, Zhipeng Zhong, Xiangjian Meng, Xiang Li, Jingli Wang, Jianlu Wang, Lei Zhang, Jianlin Shi, Bangchi Huang
article en
36 citations

Abstract

Deep ultraviolet (DUV) photodetection usually relies on wide-bandgap semiconductors, which however face challenges in material growth and doping processes. In this work, we proposed and validated a photodetection scheme based on tunneling barrier modulation, achieving highly sensitive DUV photodetection. Using a two-dimensional van der Waals heterostructure, the device integrates MoS<sub>2</sub> as the transporting layer for its high carrier mobility and low dark current, few-layered graphene (FLG) as the photon absorption layer, and hexagonal boron nitride (hBN) as the dielectric barrier. The device exhibits an photoresponsivity of 4.4 × 10<sup>6 </sup>A·W<sup>-1</sup> and specific detectivity of 1.4 × 10<sup>17</sup> <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"><mml:mi>cm</mml:mi> <mml:mo>⋅</mml:mo> <mml:msup><mml:mrow><mml:mi>H</mml:mi> <mml:mi>z</mml:mi></mml:mrow> <mml:mrow><mml:mo>-</mml:mo> <mml:mn>1</mml:mn> <mml:mo>/</mml:mo> <mml:mn>2</mml:mn></mml:mrow> </mml:msup> <mml:mo>⋅</mml:mo> <mml:msup><mml:mrow><mml:mi>W</mml:mi></mml:mrow> <mml:mrow><mml:mo>-</mml:mo> <mml:mn>1</mml:mn></mml:mrow> </mml:msup> </mml:math> for 250 nm DUV light, with a rejection ratio R<sub>250</sub>/R<sub>450</sub> exceeding 10<sup>6</sup> for visible light. Unlike conventional photodetectors, the cutoff wavelength is determined by the tunneling barrier rather than the material bandgap. Additionally, this photodetection scheme has been extended to a wide range of materials, utilizing different charge transporting layer (e.g., MoS<sub>2</sub>, ReS<sub>2</sub>), barrier layer (e.g., hBN, Al<sub>2</sub>O<sub>3</sub>), and photon absorption materials (e.g., FLG, PdSe<sub>2</sub>, Au, Pd), showcasing its broad adaptability and potential for extensive application. Furthermore, the device has been successfully employed as a power meter for weak UV radiation (0.1 μW·cm<sup>-2</sup>) and for measuring solar UV irradiance with results matching the meteorological agency's weather reports. Overall, this work introduces an effective approach for developing high-performance DUV photodetectors, highlighting significant potential for applications in the optoelectronic market.

Nature CommunicationsVol. 16(1)
Fudan University (CN), Lanzhou Jiaotong University (CN), Shanghai Institute of Technical Physics (CN)
National Natural Science Foundation of China
Openalex Percentile: Top 0%
2D Materials and Applications
18.64
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