p-NiO/LiNiO-GaN Heterojunctions: A Potential Alternative to p-GaN for Advanced Devices

In this work, we introduce a p-NiO/LiNiO stack grown via low-temperature deposition processes, offering an effective alternative for creating localized p-type regions in GaN devices. This stack combines a high hole concentration p-NiO film ([h] <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$= 2\times 10^{{19}}$ </tex-math></inline-formula> cm<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${}^{-{3}}$ </tex-math></inline-formula>) with an epitaxially crystalline p-LiNiO film, resulting in a high-quality p-type layer that can be flexibly deposited and patterned on GaN devices. Here, we investigate the transport and breakdown properties of the p-NiO/LiNiO-GaN heterojunction by fabricating a p-NiO/LiNiO-GaN PiN diode. The PiN diode exhibited excellent electrical performance, including a low turn-on voltage (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V} _{\text {ON}}$ </tex-math></inline-formula>) of 1.7 V, a low specific on-state resistance (R<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${}_{\text {ON},\text {sp}}$ </tex-math></inline-formula>) of 1.15 m<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\Omega \cdot $ </tex-math></inline-formula>cm2, and a high breakdown voltage (BV) exceeding 1000 V, comparable to those achieved with epitaxial GaN homojunctions. These results highlight the potential of utilizing conductive and compatible p-NiO/LiNiO stacks to replace p-GaN for high-quality localized p-n junctions, simplifying the manufacturability of GaN-based devices and enabling advanced device concepts where p-GaN is challenging to be implemented.

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Publication Details

Journal
IEEE Electron Device Letters
Published
2025-03-07
DOI
https://doi.org/10.1109/led.2025.3549252
Citations
2
Primary Topic
Ga2O3 and related materials
Type
article
Field-Weighted Citation Impact
0.85

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article

p-NiO/LiNiO-GaN Heterojunctions: A Potential Alternative to p-GaN for Advanced Devices

Alessandro Floriduz, Yuan Zong, Mounir Mensi, Uiho Choi et al.
2 citations
IEEE Electron Device Letters
Ga2O3 and related materials
0.85
article

p-NiO/LiNiO-GaN Heterojunctions: A Potential Alternative to p-GaN for Advanced Devices

Alessandro Floriduz, Yuan Zong, Mounir Mensi, Uiho Choi, Elison Matioli, Hao Zheng
article en
2 citations

Abstract

In this work, we introduce a p-NiO/LiNiO stack grown via low-temperature deposition processes, offering an effective alternative for creating localized p-type regions in GaN devices. This stack combines a high hole concentration p-NiO film ([h] <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$= 2\times 10^{{19}}$ </tex-math></inline-formula> cm<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${}^{-{3}}$ </tex-math></inline-formula>) with an epitaxially crystalline p-LiNiO film, resulting in a high-quality p-type layer that can be flexibly deposited and patterned on GaN devices. Here, we investigate the transport and breakdown properties of the p-NiO/LiNiO-GaN heterojunction by fabricating a p-NiO/LiNiO-GaN PiN diode. The PiN diode exhibited excellent electrical performance, including a low turn-on voltage (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V} _{\text {ON}}$ </tex-math></inline-formula>) of 1.7 V, a low specific on-state resistance (R<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${}_{\text {ON},\text {sp}}$ </tex-math></inline-formula>) of 1.15 m<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\Omega \cdot $ </tex-math></inline-formula>cm2, and a high breakdown voltage (BV) exceeding 1000 V, comparable to those achieved with epitaxial GaN homojunctions. These results highlight the potential of utilizing conductive and compatible p-NiO/LiNiO stacks to replace p-GaN for high-quality localized p-n junctions, simplifying the manufacturability of GaN-based devices and enabling advanced device concepts where p-GaN is challenging to be implemented.

IEEE Electron Device LettersVol. 46(5)
École Polytechnique Fédérale de Lausanne (CH)
Schweizerischer Nationalfonds zur Förderung der Wissenschaftlichen Forschung
Openalex Percentile: Top 30%
Ga2O3 and related materials
0.85
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