p-NiO/LiNiO-GaN Heterojunctions: A Potential Alternative to p-GaN for Advanced Devices
In this work, we introduce a p-NiO/LiNiO stack grown via low-temperature deposition processes, offering an effective alternative for creating localized p-type regions in GaN devices. This stack combines a high hole concentration p-NiO film ([h] <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$= 2\times 10^{{19}}$ </tex-math></inline-formula> cm<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${}^{-{3}}$ </tex-math></inline-formula>) with an epitaxially crystalline p-LiNiO film, resulting in a high-quality p-type layer that can be flexibly deposited and patterned on GaN devices. Here, we investigate the transport and breakdown properties of the p-NiO/LiNiO-GaN heterojunction by fabricating a p-NiO/LiNiO-GaN PiN diode. The PiN diode exhibited excellent electrical performance, including a low turn-on voltage (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V} _{\text {ON}}$ </tex-math></inline-formula>) of 1.7 V, a low specific on-state resistance (R<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${}_{\text {ON},\text {sp}}$ </tex-math></inline-formula>) of 1.15 m<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\Omega \cdot $ </tex-math></inline-formula>cm2, and a high breakdown voltage (BV) exceeding 1000 V, comparable to those achieved with epitaxial GaN homojunctions. These results highlight the potential of utilizing conductive and compatible p-NiO/LiNiO stacks to replace p-GaN for high-quality localized p-n junctions, simplifying the manufacturability of GaN-based devices and enabling advanced device concepts where p-GaN is challenging to be implemented.
Authors
- Alessandro Floriduz (ORCID: https://orcid.org/0000-0003-2795-2135)
- Yuan Zong (ORCID: https://orcid.org/0000-0002-6036-2711)
- Mounir Mensi (ORCID: https://orcid.org/0009-0004-5319-1792)
- Uiho Choi (ORCID: https://orcid.org/0000-0002-8907-2937)
- Elison Matioli (ORCID: https://orcid.org/0000-0001-6475-001X)
- Hao Zheng (ORCID: https://orcid.org/0000-0001-9675-308X)
Institutions
- École Polytechnique Fédérale de Lausanne (CH)
Publication Details
- Journal
- IEEE Electron Device Letters
- Published
- 2025-03-07
- DOI
- https://doi.org/10.1109/led.2025.3549252
- Citations
- 2
- Primary Topic
- Ga2O3 and related materials
- Type
- article
- Field-Weighted Citation Impact
- 0.85
Funders
- Schweizerischer Nationalfonds zur Förderung der Wissenschaftlichen Forschung