High temperature performance of Mn Co oxide coatings deposited by HiPIMS for interconnect application in Solid Oxide Cell

To decrease the volatilization rate of Cr on AISI 441 interconnect for Solid Oxide Cells (SOC) application, Mn 0.5 Co 0.5 O coatings were deposited using Reactive High Power Impulse Magnetron Sputtering (R-HiPIMS). Three different coating morphologies and preferential growth orientations were obtained by varying bias and temperature settings. All synthetized Mn 0.5 Co 0.5 O coatings reduced the volatilization rate of Cr during exposure in dry air at 800 °C for 2000 h. Moreover, the Cr retention power was influenced by the preferential growth orientation of the coating. This study suggests that the deposition parameters of R-HiPIMS can be adjusted to optimize the crystalline orientation and enhance the effectiveness of Mn Co oxide coatings as barriers against chromium volatilization. • Coatings of (Mn,Co)O and (Mn,Co) 3 O 4 oxides were synthetized by R-HiPIMS on AISI 441 stainless steel. • Different (Mn,Co)O structures were made by adjusting polarization and deposition temperature. • The Cr retention capacity of the coating at 800 °C was influenced by the coating structure. • (Mn,Co)O coating showed good results against Cr volatilization for a SOC application.