Synthesis and Characterizations of a Nonalkyl Tin Oxo Cluster and its Application as High EUV Absorption Coefficient and Etch Resistant Inorganic Resist for EUV Lithography
We introduce a novel nonalkyl tin oxo cluster, CNU-TOC-01(4C-C), synthesized through a reflux-based solution reaction using SnCl<sub>2</sub>, H<sub>2</sub>O, and pyrazole, which permits scalable production and molecular customization. Using field desorption-time-of-flight mass spectrometry (FD-TOF MS) and small-angle X-ray scattering (SAXS), CNU-TOC-01(4C-C) is characterized as a cyclic cluster with the molecular formula Sn<sub>4</sub>Cl<sub>3</sub>(C<sub>3</sub>N<sub>2</sub>H<sub>4</sub>)(C<sub>3</sub>N<sub>2</sub>H<sub>3</sub>)H<sub>4</sub>O<sub>8</sub>. The cluster size was measured to be 11.6 Å by SAXS and estimated to be 11.1 Å lengthwise in quantum chemical calculation. The synthesized material exhibits an extreme ultraviolet (EUV) linear absorption coefficient of 20.7 μm<sup>-1</sup>. Initial application in EUVL and electron beam lithography (EBL) achieved fine line and space patterns with the potential for ultrafine resolutions upon optimization. CNU-TOC-01(4C-C)'s high etch resistance underscores its exceptional suitability as an advanced resist material for future lithographic applications.
Authors
- Hyung‐Bae Moon
- Kyuyoung Heo (ORCID: https://orcid.org/0000-0001-6365-6363)
- Geonhwa Kim (ORCID: https://orcid.org/0000-0002-6203-7613)
- Minyeob Kim
- Hee-Seon Lee
- Siwoo Noh (ORCID: https://orcid.org/0000-0002-0574-2594)
- Sang Taek Heo (ORCID: https://orcid.org/0000-0001-8947-5069)
- Jiyoung Bang (ORCID: https://orcid.org/0000-0002-3957-1543)
- Sangsul Lee (ORCID: https://orcid.org/0000-0003-4697-1462)
- Hyeok Yun (ORCID: https://orcid.org/0000-0002-7501-8999)
- Ki-Jeong Kim (ORCID: https://orcid.org/0000-0001-9233-3096)
- Cheol‐Min Kim (ORCID: https://orcid.org/0000-0002-7242-1061)
- Hyun‐Dam Jeong (ORCID: https://orcid.org/0000-0002-8308-6668)
Institutions
- Pohang University of Science and Technology (KR)
- Korea Post (KR)
- Chonnam National University Hospital (KR)
- BioChem Technology (United States) (US)
- Korea Research Institute of Chemical Technology (KR)
- Pohang Accelerator Laboratory
Publication Details
- Journal
- Inorganic Chemistry
- Published
- 2025-03-05
- DOI
- https://doi.org/10.1021/acs.inorgchem.5c00495
- Citations
- 8
- Primary Topic
- Advancements in Photolithography Techniques
- Type
- article
- Field-Weighted Citation Impact
- 5.84
Funders
- Ministry of Trade, Industry and Energy
- National Research Foundation of Korea