High-Performance Planar Thin-Film Thermoelectric Cooler Based on Sputtered Nanocrystalline Bi<sub>2</sub>Te<sub>3</sub>/Bi<sub>0.5</sub>Sb<sub>1.5</sub>Te<sub>3</sub> Thin Films for On-Chip Cooling
The development of high-performance thin-film thermoelectric coolers (TFTECs) that are compatible with standard integrated circuit processes and can reduce power consumption is critical to achieving large-scale applications. In this work, we fabricate a planar TFTEC based on nanocrystalline p-type Bi<sub>0.5</sub>Sb<sub>1.5</sub>Te<sub>3</sub> and n-type Bi<sub>2</sub>Te<sub>3</sub> thin films using magnetron sputtering, standard lithography, and postannealing processes. The power factors of the Bi<sub>0.5</sub>Sb<sub>1.5</sub>Te<sub>3</sub> and Bi<sub>2</sub>Te<sub>3</sub> thin films reach 3.63 and 4.28 mW/mK<sup>2</sup>, respectively, and the ZT values reach 0.82 and 0.93, which are comparable to those of bulk TE materials. The radial configuration of the device allows the cold-side thermal resistance to be increased and the hot-side thermal resistance to be decreased, thereby facilitating a substantial cooling temperature difference. Furthermore, the large in-plane contact area helps to reduce device resistance and power consumption. At a heating stage temperature of 360 K and a power consumption of 4.76 mW, the net cooling temperature difference of the TFTEC reaches 4 °C. The maximum temperature difference between the hot end and the cold end is 7.26 °C, while the cold end temperature remains below the ambient temperature. The high-performance planar TFTECs demonstrated in this work exhibit both a high net cooling performance and competitive fabrication cost, rendering them ideal for on-chip hotspot cooling.
Authors
- Linwei Cao (ORCID: https://orcid.org/0009-0008-5957-5403)
- Lei Gao (ORCID: https://orcid.org/0000-0003-2653-9293)
- Jun‐Tao Li (ORCID: https://orcid.org/0000-0002-9650-6385)
- Maolin Shi
- Tingrui Gong (ORCID: https://orcid.org/0000-0003-2405-839X)
- Wei Su (ORCID: https://orcid.org/0000-0002-6487-9339)
- Lianghui Li (ORCID: https://orcid.org/0000-0002-1349-8800)
- Chensheng Ma
Institutions
- China Academy of Engineering Physics (CN)
Publication Details
- Journal
- ACS Applied Materials & Interfaces
- Published
- 2025-03-05
- DOI
- https://doi.org/10.1021/acsami.4c19653
- Citations
- 10
- Primary Topic
- Advanced Thermoelectric Materials and Devices
- Type
- article
- Field-Weighted Citation Impact
- 5.18
Funders
- National Natural Science Foundation of China