A 38Mb/mm<sup>2</sup> 380/540mV Dual-Rail SRAM in 3nm-FinFET Technology
This paper describes a 3nm-FinFET high-density SRAM compiler with an interface dual-rail (IDR) architecture to enable SoC operation down to 380mV, the lowest SRAM interface voltage reported to date. The SRAM achieves a density of 38Mb/mm2, the highest 1-port SRAM density reported to date. The lOR architecture enables the SRAM <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">${V}_{{DD}}$</tex> interface to go as low as the shared SoC <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">${V}_{{DD}}$</tex> standard logic, unrestricted by SRAM internal operations or the SRAM bitcell array supply voltage, <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">${V}_{{DDA}}$</tex> The lowest possible SoC power can be achieved by supporting the lowest possible standard logic operational <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">${V}_{{DDMIN}}$</tex> without impacting SRAM functionality or yield. level-shifting performance and area penalties typical of dual-rail designs are minimized with the lOR architecture. Key design features include an extended-range level shifter (ERLS), an integrated input latch and ERLS, a clock buffer with hig <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">${h}$</tex> -voltage level-shift bypass, and an integrated output latch and level-shifter (LS). The SRAM compiler generates instances up to 1.3Mb capacity, which can be used for SoC memory applications such as a shared multi-CPU L3-data cache.
Authors
- Vikram Kumar (ORCID: https://orcid.org/0000-0001-8113-9765)
- Y Patel (ORCID: https://orcid.org/0000-0003-3199-8275)
- Shailendra Sharad
- J. Barth
- Harold Pilo (ORCID: https://orcid.org/0009-0002-6782-965X)
- Peter Lee (ORCID: https://orcid.org/0000-0002-3898-8881)
- Shakti Singh
- Kapil Dev Dwivedi
- Prasanna Nalawar
Institutions
- Synopsys (United States) (US)
Publication Details
- Published
- 2025-02-16
- DOI
- https://doi.org/10.1109/isscc49661.2025.10904627
- Citations
- 2
- Primary Topic
- Semiconductor materials and devices
- Type
- article
- Field-Weighted Citation Impact
- 1.46