Research on the Micromorphology of the Native Surface of 2-Inch Aluminum Nitride Single Crystals

High-quality 2-inch aluminum nitride (AlN) crystals were grown using a double-zone resistance heating system, and the growth mechanism of AlN bulk crystals was further investigated. It was found that during the growth process, the vapor pressure at the growth interface, as well as the quality and structure of the seed crystal, was closely related to the growth conditions. The 2-inch AlN crystals were characterized using high-resolution X-ray diffraction (HRXRD) and optical microscopy. Optical microscopy observations of different regions on the native surface of the crystals revealed several morphologies, including regular step flow, irregular step flow, and domain-like structures. Comparisons showed that areas of the crystal surface with regular step-flow morphology exhibited high crystal quality, whereas the crystal quality decreased progressively as the step-flow morphology diminished. Therefore, the crystal quality can be preliminarily assessed through the surface morphology, providing guidance for improving the crystal growth process.

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Publication Details

Journal
Materials
Published
2025-03-04
DOI
https://doi.org/10.3390/ma18051147
Citations
1
Primary Topic
GaN-based semiconductor devices and materials
Type
article
Field-Weighted Citation Impact
1.26

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Research on the Micromorphology of the Native Surface of 2-Inch Aluminum Nitride Single Crystals

Ruixian Yu, Gang Zhao, Wenjing Tang, Kai Jiang et al.
1 citations
Materials
GaN-based semiconductor devices and materials
1.26
article

Research on the Micromorphology of the Native Surface of 2-Inch Aluminum Nitride Single Crystals

Ruixian Yu, Gang Zhao, Wenjing Tang, Kai Jiang, Lei Zhang, Wei Xia
article en
1 citations

Abstract

High-quality 2-inch aluminum nitride (AlN) crystals were grown using a double-zone resistance heating system, and the growth mechanism of AlN bulk crystals was further investigated. It was found that during the growth process, the vapor pressure at the growth interface, as well as the quality and structure of the seed crystal, was closely related to the growth conditions. The 2-inch AlN crystals were characterized using high-resolution X-ray diffraction (HRXRD) and optical microscopy. Optical microscopy observations of different regions on the native surface of the crystals revealed several morphologies, including regular step flow, irregular step flow, and domain-like structures. Comparisons showed that areas of the crystal surface with regular step-flow morphology exhibited high crystal quality, whereas the crystal quality decreased progressively as the step-flow morphology diminished. Therefore, the crystal quality can be preliminarily assessed through the surface morphology, providing guidance for improving the crystal growth process.

MaterialsVol. 18(5)
Shandong University (CN), University of Jinan (CN), State Key Laboratory of Crystal Materials
National Natural Science Foundation of China
Openalex Percentile: Top 24%
GaN-based semiconductor devices and materials
1.26
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