Gallium Nitride High Electron Mobility Transistor Device with Integrated On-Chip Array Junction Temperature Monitoring Unit

Herein, we present a novel method for junction temperature monitoring of GaN HEMT devices to achieve real-time temperature perception at different locations on the device surface. Through sputtering patterned Ti/Pt thermistor strips on the surface of a GaN HEMT device to construct an on-chip array junction temperature monitoring unit, the thermal distribution of the device during operation is fully reflected. The developed temperature monitoring unit exhibited a desirable temperature coefficient of resistance of 0.183%/°C in the range of 25 °C to 205 °C. Comparison with the thermal imager shows that the integrated temperature monitoring unit can accurately reflect the real-time temperature with a monitoring accuracy of more than 95%, which helps to improve the long-term reliability of GaN power devices under actual application conditions of high frequency and high power density.

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Publication Details

Journal
Micromachines
Published
2025-03-04
DOI
https://doi.org/10.3390/mi16030304
Citations
1
Primary Topic
GaN-based semiconductor devices and materials
Type
article
Field-Weighted Citation Impact
1.26
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Gallium Nitride High Electron Mobility Transistor Device with Integrated On-Chip Array Junction Temperature Monitoring Unit

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article

Gallium Nitride High Electron Mobility Transistor Device with Integrated On-Chip Array Junction Temperature Monitoring Unit

Jinlin Wu, Yu‐Kuan Chang, Xu Zhang, Yue Su, Hongda Chen, Mingke Xiao
article en
1 citations

Abstract

Herein, we present a novel method for junction temperature monitoring of GaN HEMT devices to achieve real-time temperature perception at different locations on the device surface. Through sputtering patterned Ti/Pt thermistor strips on the surface of a GaN HEMT device to construct an on-chip array junction temperature monitoring unit, the thermal distribution of the device during operation is fully reflected. The developed temperature monitoring unit exhibited a desirable temperature coefficient of resistance of 0.183%/°C in the range of 25 °C to 205 °C. Comparison with the thermal imager shows that the integrated temperature monitoring unit can accurately reflect the real-time temperature with a monitoring accuracy of more than 95%, which helps to improve the long-term reliability of GaN power devices under actual application conditions of high frequency and high power density.

MicromachinesVol. 16(3)
Chinese Academy of Sciences (CN), Institute of Semiconductors (CN), University of Chinese Academy of Sciences (CN)
Affordable and clean energy
Openalex Percentile: Top 24%
GaN-based semiconductor devices and materials
1.26
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