Analytical modeling of atomic-number-dependent electronic stopping cross sections in Si, C, 4H-SiC, Al, Ni, and Ag

Abstract Atomic number ( Z 1 ) dependencies of electronic stopping cross sections ( S e ) for channeling trajectories had been well explained for low-velocity ions; however, this is not the case with S e for random trajectories ( S e random ). We modeled the difference between the effective atomic number for random trajectories and that for channeling ones ( Z′ ) changing linearly with the difference between the actual atomic number and Z′ . The proportionality constant k for S e random in Al, Ni, and Ag for 1.8 × 10 8 cm s −1 ions was found to depend little on the target atomic number. k for S e random in 4H-SiC for 1.5 × 10 8 cm s −1 ions, on the other hand, located between k for S e random in Si for 1.5 × 10 8 cm s −1 ions and k determined from that for 1.4 × 10 8 cm s −1 ions in C and that for 2.0 × 10 8 cm s −1 ions in C.

Authors

Institutions

Publication Details

Journal
Japanese Journal of Applied Physics
Published
2025-03-04
DOI
https://doi.org/10.35848/1347-4065/adbc78
Citations
1
Primary Topic
Semiconductor materials and devices
Type
article
Field-Weighted Citation Impact
0.73
Controls
|||
ALL TIME
JAN
FEB
MAR
APR
MAY
JUN
JUL
AUG
SEP
OCT
article

Analytical modeling of atomic-number-dependent electronic stopping cross sections in Si, C, 4H-SiC, Al, Ni, and Ag

Kazuhiro Mochizuki, Tomoaki Nishimura, Tomoyoshi Mishima
1 citations
Japanese Journal of Applied Physics
Semiconductor materials and devices
0.73
article

Analytical modeling of atomic-number-dependent electronic stopping cross sections in Si, C, 4H-SiC, Al, Ni, and Ag

Kazuhiro Mochizuki, Tomoaki Nishimura, Tomoyoshi Mishima
article en
1 citations

Abstract

Abstract Atomic number ( Z 1 ) dependencies of electronic stopping cross sections ( S e ) for channeling trajectories had been well explained for low-velocity ions; however, this is not the case with S e for random trajectories ( S e random ). We modeled the difference between the effective atomic number for random trajectories and that for channeling ones ( Z′ ) changing linearly with the difference between the actual atomic number and Z′ . The proportionality constant k for S e random in Al, Ni, and Ag for 1.8 × 10 8 cm s −1 ions was found to depend little on the target atomic number. k for S e random in 4H-SiC for 1.5 × 10 8 cm s −1 ions, on the other hand, located between k for S e random in Si for 1.5 × 10 8 cm s −1 ions and k determined from that for 1.4 × 10 8 cm s −1 ions in C and that for 2.0 × 10 8 cm s −1 ions in C.

Japanese Journal of Applied PhysicsVol. 64(4)
Hosei University (JP)
Openalex Percentile: Top 31%
Semiconductor materials and devices
0.73
AI Navigator

Ask Laika to Summarize, Analyze, and Connect papers live on the map.

Summarize Papers & Methodologies

Extract key findings, datasets, and comparative methods across publications.

Benchmark Rankings & Visual Analytics

Rank top research institutions, authors, funders, topics, and journals by Field-Weighted Citation Impact (FWCI) and paper volume with instant charts.

Connect Distant Disciplines

Bridge topological clusters on the map to find hidden collaborative intersections.

Analytical modeling of atomic-number-dependent electronic stopping cross sections in Si, C, 4H-SiC, Al, Ni, and Ag — Kazuhiro Mochizuki, Tomoaki Nishimura, et al. · Japanese Journal of Applied Physics (2025) | TGRS Research Map | TGRS