Non‐perturbative cathodoluminescence microscopy of beam‐sensitive materials
Cathodoluminescence microscopy is now a well-established and powerful tool for probing the photonic properties of nanoscale materials, but in many cases, nanophotonic materials are easily damaged by the electron-beam doses necessary to achieve reasonable cathodoluminescence signal-to-noise ratios. Two-dimensional materials have proven particularly susceptible to beam-induced modifications, yielding both obstacles to high spatial-resolution measurement and opportunities for beam-induced patterning of quantum photonic systems. Here pan-sharpening techniques are applied to cathodoluminescence microscopy in order to address these challenges and experimentally demonstrate the promise of pan-sharpening for minimally-perturbative high-spatial-resolution spectrum imaging of beam-sensitive materials.
Authors
- Rama Krishnan Vasudevan (ORCID: https://orcid.org/0000-0003-4692-8579)
- Tilo H. Yang (ORCID: https://orcid.org/0000-0002-7048-9513)
- Benjamin J. Lawrie (ORCID: https://orcid.org/0000-0003-1431-066X)
- Anthony J. Nicastro
- Nannan Mao (ORCID: https://orcid.org/0000-0003-3522-5341)
- Kyle P. Kelley (ORCID: https://orcid.org/0000-0002-7688-0484)
- Daniel Lévy (ORCID: https://orcid.org/0000-0001-5740-3378)
- Yueh‐Chun Wu (ORCID: https://orcid.org/0000-0002-9299-6882)
- Tianyi Zhang (ORCID: https://orcid.org/0000-0002-8998-3837)
- Jing Kong (ORCID: https://orcid.org/0000-0002-8048-3289)
- Malcolm Bogroff
- Gabriel Cowley
Institutions
- Oak Ridge National Laboratory (US)
- Massachusetts Institute of Technology (US)
Publication Details
- Journal
- Nanophotonics
- Published
- 2025-03-04
- DOI
- https://doi.org/10.1515/nanoph-2024-0724
- Citations
- 2
- Primary Topic
- Photoacoustic and Ultrasonic Imaging
- Type
- article
- Field-Weighted Citation Impact
- 1.35
Funders
- U.S. Department of Energy
- Battelle
- UT-Battelle
- Office of Science
- Basic Energy Sciences
- Workforce Development for Teachers and Scientists