A Comparative Study of Titanium-Based Coatings Prepared by Magnetron Sputtering for Biomedical Applications

This study investigates the effects of substrate bias voltage on the properties of titanium nitride (TiN) and titanium oxynitride (TiON) thin films deposited via High-Power Impulse Magnetron Sputtering (HiPIMS). The structure and morphology of the obtained coatings were characterized using X-ray diffraction (XRD), scanning electron microscopy (SEM), and atomic force microscopy (AFM). TiN coatings exhibited hydrophilic behavior, while TiON coatings demonstrated hydrophobic characteristics. Electrochemical corrosion testing in Hank’s solution revealed superior corrosion resistance for TiON films deposited at −100 V, indicating their potential for biomedical applications. The observed differences in wettability and corrosion resistance are attributed to the influence of substrate bias voltage on the films’ microstructure and surface chemistry.