Quantitative Analysis of Chloride Ion Influence on the Surface Morphology of Electrodeposited Polycrystalline Nickel Films

Different anions are well-known to influence the microstructure and morphology of electrodeposited polycrystalline metal films, and thereby their suitability for specific applications. However, quantifying their effects on film morphology remains a challenge. Here we present results for Ni thin films electrodeposited under potentiostatic control from two types of nickel sulphate bath with or without the presence of 0.2 M chloride ions. Slope and scaling analysis of atomic force microscopy data reveal clear differences in the morphologies of films deposited from the two baths. X-ray diffraction and electron backscatter diffraction enables correlation of these differences with the film microstructures. Additionally, slope analysis provides insight into the terrace width, a quantity important in understanding the thin film growth process.