Quasi-Two-Dimensional Gold Films for Plasmonic and Optoelectronic Applications

Ultrathin metal films are an important element for transparent optoelectronics including displays, photovoltaics and sensors, where the use of flexible and durable electrodes is needed. Nevertheless, fabrication of ultrathin, continuous and smooth metal films is quite challenging and restricted by a variety of factors, including deposition techniques and substrate. Much effort has been expended in creating ultrathin gold and silver films as transparent conductor, but the methods developed have often been limited to the choice of substrate and its surface modification, thus transferring the already resulted ultrathin film to the target surface looks promising. Here, we introduce a facile technique for fabrication and transfer of ultrathin (<10 nm) gold films onto target substrate presenting their structural morphology and electrical properties analysis, which showed high quality and low sheet resistance of the obtained gold films.