Effect of capping on the Dirac semimetal Cd<sub>3</sub>As<sub>2</sub> on Si grown via molecular beam epitaxy
Given the promising applications of large magnetoresistance in the Dirac semimetal cadmium arsenide (Cd<sub>3</sub>As<sub>2</sub>), extensive research into Si-compatible Cd<sub>3</sub>As<sub>2</sub>devices is highly desirable. To prevent surface degradation and oxidation, the implementation of a protection layer on Cd<sub>3</sub>As<sub>2</sub>is imperative. In this study, two vastly different protecting layers were prepared on top of two Cd<sub>3</sub>As<sub>2</sub>samples. A zinc telluride layer was grown on top of one Cd<sub>3</sub>As<sub>2</sub>film, giving rise to a ten-fold increased mobility, compared to that of the pristine Cd<sub>3</sub>As<sub>2</sub>sample. Interestingly, unusual negative magnetoresistance is observed in the hexagonal boron nitride-capped Cd<sub>3</sub>As<sub>2</sub>device when a magnetic field is applied perpendicularly to the Cd<sub>3</sub>As<sub>2</sub>plane. This is in sharp contrast to the chiral anomaly that requires a magnetic field parallel to the Cd<sub>3</sub>As<sub>2</sub>plane. We suggest that a protection layer on molecular beam epitaxy-grown Cd<sub>3</sub>As<sub>2</sub>should be useful for realising its great device applications in magnetic sensing.
Authors
- Chiashain Chuang (ORCID: https://orcid.org/0000-0002-7677-8121)
- Cheng-Hsueh Yang (ORCID: https://orcid.org/0009-0006-6352-3927)
- Takashi Taniguchi (ORCID: https://orcid.org/0000-0003-0017-7669)
- Hsin-Hsuan Lee
- Nobuyuki Aoki (ORCID: https://orcid.org/0000-0001-9203-6040)
- Kenji Watanabe (ORCID: https://orcid.org/0000-0003-3701-8119)
- Chi‐Te Liang (ORCID: https://orcid.org/0000-0003-4435-5949)
- Jie‐Ying Lee
- Ji-Wei Ci (ORCID: https://orcid.org/0000-0002-9973-8325)
- Chun-Wei Kuo
- Meng-Ting Wu (ORCID: https://orcid.org/0000-0002-4655-6907)
- Tianshun Xie (ORCID: https://orcid.org/0009-0006-7636-9105)
- Jyh-Shyang Wang
- Wei‐Chen Lin (ORCID: https://orcid.org/0009-0003-9542-3697)
Institutions
- National Institute of Standards and Technology (US)
- Chung Yuan Christian University (TW)
- Chiba University (JP)
- National Taiwan University (TW)
- National Institute for Materials Science (JP)
- National Tsing Hua University (TW)
- Institute of Information Science, Academia Sinica (TW)
- Physical Measurement Laboratory (US)
- Taiwan Semiconductor Manufacturing Company (Taiwan) (TW)
- Academia Sinica (TW)
Publication Details
- Journal
- Nanotechnology
- Published
- 2025-02-28
- DOI
- https://doi.org/10.1088/1361-6528/adbb74
- Citations
- 1
- Primary Topic
- Topological Materials and Phenomena
- Type
- article
- Field-Weighted Citation Impact
- 1.25
Funders
- Chung Yuan Christian University
- Chiba University
- Japan Society for the Promotion of Science