A moving mesh method for analyzing dual-phase-lag heat transfer in silicon substrate heated by a moving laser pulse source

Abstract We investigated the thermal characteristics of silicon substrate under the effect of a moving laser source using the 2D dual-phase-lag heat transfer theory. A moving mesh technique that is effective has been proposed to address the physical issue mentioned above. Specifically, the 1D moving mesh partial differential formulation is used to build the 2D adaptable mesh dimension by dimension using a suitable monitor operation of the area of temperature. The finite difference approach is then used to resolve the model issue on the adaptable mesh. The algorithm’s efficiency is confirmed by the numerical findings. Furthermore, research has been conducted to investigate the impact of pulse duration and phase lag factors on the silicon substrate’s thermal response.