Development and Research of the MOCVD Cleaning Robot

With the wide application of the gallium nitride (GaN) preparation method based on Metal–Organic Chemical Vapor Deposition (MOCVD), the automation of MOCVD equipment has become a research hotspot. This paper explores the automation scheme of MOCVD reaction chamber cleaning to improve productivity and reduce labor costs. Firstly, this paper establishes the kinematic solution model of a MOCVD cleaning robot and designs the cleaning robot path planning control algorithm. Considering the error between the initial position of the robot end-effector and the desired initial position in practical applications, this paper further designs a fault-tolerant motion planning algorithm for the initial position error. The simulation results show that the method can effectively reduce the initial position error and make it converge exponentially to zero. Finally, this paper builds the robot control system of the cleaning system and verifies the cleaning effect through tests. The test results show that the system can meet the actual use requirements and realize the reaction chamber cleaning automation goal.