Enhanced Photoelectric Performance of <i>β</i>-Ga₂O₃ Phototransistors via NH₃ Plasma Pretreatment for Ultra-Sensitive Solar-Blind UV Detection

This work presents <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\beta $ </tex-math></inline-formula>-Ga2O3 phototransistors with exceptional photoelectric performance, enhanced by NH3 plasma pretreatment prior to Al2O3 dielectric deposition. The devices achieve a remarkable responsivity (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${R}\text {)}$ </tex-math></inline-formula> of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$1.3 \times 10^{{6}}$ </tex-math></inline-formula> A/W and a record-high detectivity (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${D}^{\ast } \text {)}$ </tex-math></inline-formula> of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$2.8 \times 10^{{19}}$ </tex-math></inline-formula> Jones under 254 nm ultraviolet (UV) light. Rapid photoresponse is demonstrated, with a rise time (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\tau _{\text {r}}\text {)}$ </tex-math></inline-formula> of 90 ms and a decay time (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\tau _{\text {d}}\text {)}$ </tex-math></inline-formula> of 1 ms under a 1 Hz pulsed UV light source. These superior characteristics are attributed to NH3 plasma-induced improvements at the Al2O3/<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\beta $ </tex-math></inline-formula>-Ga2O3 interface, including reduced trap density and enhanced dielectric adhesion. The findings provide a promising pathway to advance <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\beta $ </tex-math></inline-formula>-Ga2O3 phototransistors for ultra-sensitive, solar-blind UV detection with rapid response capabilities.

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Publication Details

Journal
IEEE Electron Device Letters
Published
2025-02-26
DOI
https://doi.org/10.1109/led.2025.3545485
Citations
4
Primary Topic
Ga2O3 and related materials
Type
article
Field-Weighted Citation Impact
1.71

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article

Enhanced Photoelectric Performance of β-Ga₂O₃ Phototransistors via NH₃ Plasma Pretreatment for Ultra-Sensitive Solar-Blind UV Detection

Xiangyu Zeng, Cizhe Fang, Genquan Han, Xiaole Jia et al.
4 citations
IEEE Electron Device Letters
Ga2O3 and related materials
1.71
article

Enhanced Photoelectric Performance of β-Ga₂O₃ Phototransistors via NH₃ Plasma Pretreatment for Ultra-Sensitive Solar-Blind UV Detection

Xiangyu Zeng, Cizhe Fang, Genquan Han, Xiaole Jia, Yang Zhou, Yan Liu, Yibo Wang, Yu Wang, Xiaoxi Li, Yue Hao, Yuan Fang, Shuqi Huang, Zhifan Wu
article en
4 citations

Abstract

This work presents <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\beta $ </tex-math></inline-formula>-Ga2O3 phototransistors with exceptional photoelectric performance, enhanced by NH3 plasma pretreatment prior to Al2O3 dielectric deposition. The devices achieve a remarkable responsivity (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${R}\text {)}$ </tex-math></inline-formula> of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$1.3 \times 10^{{6}}$ </tex-math></inline-formula> A/W and a record-high detectivity (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${D}^{\ast } \text {)}$ </tex-math></inline-formula> of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$2.8 \times 10^{{19}}$ </tex-math></inline-formula> Jones under 254 nm ultraviolet (UV) light. Rapid photoresponse is demonstrated, with a rise time (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\tau _{\text {r}}\text {)}$ </tex-math></inline-formula> of 90 ms and a decay time (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\tau _{\text {d}}\text {)}$ </tex-math></inline-formula> of 1 ms under a 1 Hz pulsed UV light source. These superior characteristics are attributed to NH3 plasma-induced improvements at the Al2O3/<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\beta $ </tex-math></inline-formula>-Ga2O3 interface, including reduced trap density and enhanced dielectric adhesion. The findings provide a promising pathway to advance <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\beta $ </tex-math></inline-formula>-Ga2O3 phototransistors for ultra-sensitive, solar-blind UV detection with rapid response capabilities.

IEEE Electron Device LettersVol. 46(5)
Xidian University (CN)
National Natural Science Foundation of China, China Postdoctoral Science Foundation, Fundamental Research Funds for the Central Universities
Affordable and clean energy
Openalex Percentile: Top 17%
Ga2O3 and related materials
1.71
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