Enhanced Photoelectric Performance of <i>β</i>-Ga₂O₃ Phototransistors via NH₃ Plasma Pretreatment for Ultra-Sensitive Solar-Blind UV Detection
This work presents <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\beta $ </tex-math></inline-formula>-Ga2O3 phototransistors with exceptional photoelectric performance, enhanced by NH3 plasma pretreatment prior to Al2O3 dielectric deposition. The devices achieve a remarkable responsivity (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${R}\text {)}$ </tex-math></inline-formula> of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$1.3 \times 10^{{6}}$ </tex-math></inline-formula> A/W and a record-high detectivity (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${D}^{\ast } \text {)}$ </tex-math></inline-formula> of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$2.8 \times 10^{{19}}$ </tex-math></inline-formula> Jones under 254 nm ultraviolet (UV) light. Rapid photoresponse is demonstrated, with a rise time (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\tau _{\text {r}}\text {)}$ </tex-math></inline-formula> of 90 ms and a decay time (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\tau _{\text {d}}\text {)}$ </tex-math></inline-formula> of 1 ms under a 1 Hz pulsed UV light source. These superior characteristics are attributed to NH3 plasma-induced improvements at the Al2O3/<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\beta $ </tex-math></inline-formula>-Ga2O3 interface, including reduced trap density and enhanced dielectric adhesion. The findings provide a promising pathway to advance <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\beta $ </tex-math></inline-formula>-Ga2O3 phototransistors for ultra-sensitive, solar-blind UV detection with rapid response capabilities.
Authors
- Xiangyu Zeng (ORCID: https://orcid.org/0000-0001-9915-8542)
- Cizhe Fang (ORCID: https://orcid.org/0009-0005-9466-0919)
- Genquan Han (ORCID: https://orcid.org/0000-0001-5140-4150)
- Xiaole Jia
- Yang Zhou (ORCID: https://orcid.org/0000-0003-4826-7233)
- Yan Liu (ORCID: https://orcid.org/0000-0001-5583-0587)
- Yibo Wang (ORCID: https://orcid.org/0000-0002-4058-1319)
- Yu Wang (ORCID: https://orcid.org/0000-0003-1777-2050)
- Xiaoxi Li (ORCID: https://orcid.org/0000-0002-6007-5819)
- Yue Hao (ORCID: https://orcid.org/0000-0002-8081-2919)
- Yuan Fang (ORCID: https://orcid.org/0009-0000-6551-0245)
- Shuqi Huang (ORCID: https://orcid.org/0009-0008-7557-4822)
- Zhifan Wu
Institutions
- Xidian University (CN)
Publication Details
- Journal
- IEEE Electron Device Letters
- Published
- 2025-02-26
- DOI
- https://doi.org/10.1109/led.2025.3545485
- Citations
- 4
- Primary Topic
- Ga2O3 and related materials
- Type
- article
- Field-Weighted Citation Impact
- 1.71
Funders
- National Natural Science Foundation of China
- China Postdoctoral Science Foundation
- Fundamental Research Funds for the Central Universities