NanoFrazor Technology – Enabling Thermal Scanning Probe Lithography and Direct Laser Sublimation for Advanced 2D and Grayscale Structure Fabrication
The NanoFrazor technology is utilizing fabrication capabilities of thermal scanning probe lithography (t-SPL) and direct laser sublimation (DLS) to perform nanopatterning, either physical or chemical in nature, on a diversity of materials and substrates. With such diversity, there are still several challenges to overcome such as performing high-resolution DLS patterning on heterogeneous surfaces as well as low-fill factor nanopatterning that are often used in metasurface designs. This presentation will discuss work that is being performed to address such topics as well as an introduction to the fundamentals and workings of t-SPL and DLS for the N anoFrazor technology.
Authors
- Jana Chaaban (ORCID: https://orcid.org/0000-0001-9402-7789)
- Nicholas R. Hendricks
- Myriam Käppeli
- J. C. Stark (ORCID: https://orcid.org/0009-0007-7828-9966)
- Eliott Clerc
Publication Details
- Published
- 2024-10-21
- DOI
- https://doi.org/10.1109/nmdc58214.2024.10894124
- Primary Topic
- Advanced MEMS and NEMS Technologies
- Type
- article
- Field-Weighted Citation Impact
- 0.00