Soft Sputtering of Large‐Area 2D MoS₂ Layers Using Isolated Plasma Soft Deposition for Humidity Sensors (Adv. Mater. 8/2025)

Soft Sputtering of Large-Area 2D MoS2 Layers The hand-painted image depicts a 6-inch silicon wafer, coated with a 2D MoS2 semiconductor by IPSD, mounted on a canvas. The oil painting, created by Professor H.-K. Kim, illustrates isolated plasma confined within strong magnetic fields. This plasma environment enables the deposition of MoS2 molecules, resulting in the formation of a uniform 2D layer on the silicon wafer. More details can be found in article number 2414800 by Han-Ki Kim and co-workers.