Characterization of pattern fidelity evaluation using sine wave patterns in electron multi-beam writing

It is essential to continuously enhance the performance of electron multi-beam mask writers to support the ongoing scaling on the advanced device roadmap. In order to accomplish this, one of the crucial tasks is to establish quantitative methods for evaluating pattern fidelity, especially complex curvilinear patterns. We have proposed an evaluation method using sine wave patterns to assess the improvement in pattern fidelity. However, a deeper understanding of the method is inevitable if we aim to apply it to a wider range of evaluations on the performance of multi-beam systems. This paper presents an in-depth analysis of the evaluation method using sine wave patterns. We assess the dependence of the patterns aspects, such as the amplitudes and frequencies of sine wave patterns, on the obtained results and also analyze how the methods of measurement affect the accuracy of the obtained results.