Accelerating particle root-cause analysis for cleanliness validation of critical parts and tool surfaces by combining the best of scatterometry and SEM-EDS

A study is presented by Fastmicro in collaboration with Thermo Fisher Scientific that projects a >20x reduction in cycle time for particle characterization on a Phenom SEM-EDS using Fastmicro particle measurement data. By combining rapid scatterometry-based particle detection with SEM-EDS characterization, this accelerated workflow enables on-the-spot root-cause analysis and significantly improves efficiency in particle contamination control. These advancements are particularly valuable in the lithography supply chain, where validated ultra-clean parts and surfaces are essential for high-yield semiconductor manufacturing.