Strategies to extend resolution limits for direct write lithography

This presentation introduces methods for optimizing various direct-writing lithography systems from Heidelberg Instruments to push the resolution limit for smaller structures in collaboration with IMS Chips germany.

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Published
2025-02-21
DOI
https://doi.org/10.1117/12.3052656
Primary Topic
Advancements in Photolithography Techniques
Type
article
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article

Strategies to extend resolution limits for direct write lithography

S. Preuß, Matthias Wahl, Benedikt Stender, Steffen Diez et al.
Advancements in Photolithography Techniques
article

Strategies to extend resolution limits for direct write lithography

S. Preuß, Matthias Wahl, Benedikt Stender, Steffen Diez, Holger Sailer, Emine Cagin, Angela Schneider, George R. Moore
article en

Abstract

This presentation introduces methods for optimizing various direct-writing lithography systems from Heidelberg Instruments to push the resolution limit for smaller structures in collaboration with IMS Chips germany.

Institut für Mikroelektronik Stuttgart (DE)
Quality Education
Openalex Percentile: Top 98%
Advancements in Photolithography Techniques
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Strategies to extend resolution limits for direct write lithography — S. Preuß, Matthias Wahl, et al. · (2025) | TGRS Research Map | TGRS