Fundamental understanding of the development process for metal oxide photoresists

Understanding the impact of developer chemistry on Metal Oxide Photoresist (MOR) is important for process development and enablement of device fabrication at leading nodes. In this work, molecular simulations leveraged to evaluate combined reaction and mass transport processes relevant for film development. Collectively, developer adsorption and reaction thermodynamics are compared for select process scenarios to obtain a fundamental mechanistic understanding of MOR chemistry.