Dry development characteristics and surface analysis of spin-coated tin oxo cluster using Cl2 radical plasma
In this study, we investigate the effects of Cl2 radical plasma on the development characteristics of spin-coated Tin oxo cluster [(BuSn)12O14(OH)6](OH)2-. With Cl2 radical plasma, negative tone development was possible due to the difference in activation energy between the exposed and non-exposed films, showing 1.46 nm/min and 1.77 nm/min, respectively. Because of the lower reaction of chlorine radicals with Sn-O than the other bindings in the exposed PR, the non-exposed PR was preferentially removed compared to the exposed PR. Finally, we suggest the possible mechanism of dry development of Tin oxo clusters, and it could also be used for the development of MOR having chemical contrast before and after exposure, such as tin oxo clusters, using plasma, regardless of whether it is deposited or coated.
Authors
- Heeju Kim (ORCID: https://orcid.org/0000-0001-8117-8879)
- Min Cheol Kim (ORCID: https://orcid.org/0000-0002-2227-4374)
- Geun Young Yeom
Institutions
- Sungkyunkwan University (KR)
Publication Details
- Published
- 2025-02-21
- DOI
- https://doi.org/10.1117/12.3051628
- Primary Topic
- Nanocluster Synthesis and Applications
- Type
- article
- Field-Weighted Citation Impact
- 0.00