Next generation PI filter for advanced lithography process

In contemporary lithography processes, membranes are essential for the control of microcontamination. Nevertheless, there is an increasing demand for stringent filtration standards, particularly for sub-10nm nodes. This study presents the development of a novel 1nm polyimide membrane that possesses advanced filtration capabilities. The wettability and retention properties of the newly developed 1nm polyimide membrane are significantly enhanced compared to those of the existing 1nm polyimide membrane. We anticipate that this advancement will lead to promising applications in the advanced photoresist filtration.