Epoxide modification for enhancing chemical and suspension stability of cerium oxide polishing abrasives
Abstract In order to address the significant challenges presented by ultra-precision machining technology, conventional cerium oxide (CeO 2 ) polishing materials are incorporated into the polishing fluid as a means of resolving this issue. However, traditional CeO 2 exhibits drawbacks such as low dispersion, susceptibility to aggregation, and limited suspension stability, all of which have a negative impact on the uniformity of the polishing process. A preparation method of CeO 2 polishing fluid modified by epoxy carboxylic acid was presented. A series of modified epoxy-cerium oxide abrasives with different types and contents of surface ligands were obtained by surface modification of the precursor abrasives of CeO 2 polishing powders using different kinds and proportions of epoxy-carboxylic acids. By adding stabilizer and pH regulator to prepare the polishing liquid, the chemical and physical properties of the modified epoxy-cerium oxide abrasive can be optimized, and its reactivity and removal rate in the chemical mechanical polishing process can be improved, thus effectively enhancing the polishing efficiency. By optimizing the reaction conditions, the sample with the best ratio is selected as 50 CeO 2 -EPO 2 -@NH 3 . The modified CeO 2 was tested by SEM and TEM, its XRD pattern was collected, and thermogravimetric analysis (TGA) was performed. The results showed that the surface modification strategy was successfully realized. The surface functionalization strategy enhanced the suspension of CeO 2 abrasive in an aqueous solution. Compared with the modified epoxy-cerium oxide polishing liquid before modification, the cutting ability and removal rate did not decrease significantly, and the modified epoxy-cerium oxide polishing liquid had stronger chemical stability and suspension in the solution. It is worth noting that the local structure and surface environment of the CeO 2 surface are precisely regulated by the presence of surface epoxide carboxylic acid, which enhances the suspension property (T 50 ) of modified CeO 2 in water for up to two months. This study expands the scope of considerations for the development of cerium oxide polishing fluid.
Authors
- Fan Zhang (ORCID: https://orcid.org/0000-0002-3211-9466)
- Song Li (ORCID: https://orcid.org/0000-0003-4463-733X)
- Bo Gao (ORCID: https://orcid.org/0000-0002-7474-0015)
- Hui Cun Shen (ORCID: https://orcid.org/0000-0003-4800-437X)
- Shuming Wu
Institutions
- Inner Mongolia University (CN)
Publication Details
- Journal
- Journal of Physics Conference Series
- Published
- 2025-02-01
- DOI
- https://doi.org/10.1088/1742-6596/2962/1/012006
- Primary Topic
- Advanced Surface Polishing Techniques
- Type
- article
- Field-Weighted Citation Impact
- 0.00