Design and Realization of RF Voltage and Current Monitoring System
This paper designs a voltage-current measurement system that can be used to measure the voltage-current power and load impedance on the transmission line during semiconductor plasma etching. The system couples the mainline signals through a voltage-current monitor and processes them, and the corresponding information can be solved by calculator software. The device can realize a voltage coupling ratio of $\mathbf{- 6 0} \mathrm{dB}$ and a current coupling ratio of $\mathbf{- 5 0} \mathbf{d B}$. The overall system size is 148 mm $\times 96 \mathrm{~mm} \times 50 \mathrm{~mm}$.
Authors
- Hao Chen (ORCID: https://orcid.org/0000-0002-8052-6760)
- Cheng Zhou (ORCID: https://orcid.org/0000-0002-4091-4777)
- Hongtai Chen (ORCID: https://orcid.org/0000-0002-5035-9236)
- Wei Shen (ORCID: https://orcid.org/0000-0002-8919-8273)
- Shunli Li (ORCID: https://orcid.org/0000-0001-9668-1784)
- Hongxin Zhao (ORCID: https://orcid.org/0000-0002-0314-9084)
- Kun Wang (ORCID: https://orcid.org/0000-0001-7937-6155)
- Xiaoxing Yin (ORCID: https://orcid.org/0000-0001-5558-5534)
- Jiao Jin
- Lang Hu (ORCID: https://orcid.org/0009-0002-4952-0528)
Institutions
- State Key Laboratory of Millimeter Waves
- Southeast University (CN)
Publication Details
- Published
- 2024-09-22
- DOI
- https://doi.org/10.1109/apcap62011.2024.10881785
- Primary Topic
- Advanced Sensor and Control Systems
- Type
- article
- Field-Weighted Citation Impact
- 0.00