Correction to “Hydrogenation Strategy for Al<sub>2</sub>O<sub>3</sub>/MoO<sub><i>x</i></sub> Passivating Contact in High‐Efficiency Crystalline Silicon Solar Cells”

In paragraph 3 of the "Results and Discussion" section, the text "The Q f value for H*-Al 2 O 3 films was -4.74 10 12 cm -2 , higher than the values for H-Al 2 O 3 (-4.63 10 12 cm -2 ), Al 2 O 3 (-4.5 10 12 cm -2 ), and H*-Al 2 O 3 (O 3 ) (-4.41 10 12 cm -2 )." was incorrect.This should have read: "The Q f value for H*-Al 2 O 3 films was -2.45 10 10 cm -2 , higher than the values for H-Al 2 O 3 (-1.64 10 10 cm -2 ), Al 2 O 3 (-1.08 10 10 cm -2 ), and H*-Al 2 O 3 (O 3 ) (-9.6 10 9 cm -2 )."In Note S1 of "Supporting Information", the text "From formula 1, we can obtain the Q f of Al 2 O 3 which equals to -4.5 10 12 cm -2 based on the V fb = 1.21 V and the oxide capacitance C ox = 7.47 10 -12 F. The Q f of H-Al 2 O 3 film calculated from the V fb = 1.32 V and the oxide capacitance C ox = 7.3 10 -12 F is -4.63 10 12 cm -2 .The Q f of H*-Al 2 O 3 film calculated from the V fb = 1.18 V and the oxide capacitance C ox = 7.98 10 -12 F is -4.74 10 12 cm -2 .And the Q f of H*-Al 2 O 3 (O 3 ) film calculated from the V fb = 1.31V and the oxide capacitance C ox = 6.98 10 -12 F is -4.41 10 12 cm -2 " was incorrect.This should have read: "From formula 1, we can obtain the Q f of Al 2 O 3 which equals to -1.08 10 10 cm -2 based on the V fb = -0.6V and the oxide capacitance C ox = 2.58 10 -11 F. The Q f of H-Al 2 O 3 film calculated from the V fb = -0.63V and the oxide capacitance C ox = 2.89 10 -11 F is -1.64 10 10 cm -2 .The Q f of H*-Al 2 O 3 film calculated from the V fb = 0.63 V and the oxide capacitance C ox = 3 10 -11 F is -2.45 10 10 cm -2 .And the Q f of H*-Al 2 O 3 (O 3 ) film calculated from the V fb = -0.57V and the oxide capacitance C ox = 2.81 10 -11 F is -9.6 10 9 cm -2 ."The authors also admitted to an image compilation error in Figure 2b and were able to provide the original image.The erroneous C-V curves on the p-Si MOS structure in our manuscript were due to an incorrect polarity connection, which also caused an erroneous extraction of the flat-band voltage.The authors confirm that all the experimental results and corresponding conclusions mentioned in the paper remain unaffected.The corrected Figure 2b is shown as follows.

Authors

Publication Details

Journal
Solar RRL
Published
2025-02-18
DOI
https://doi.org/10.1002/solr.202500031
Primary Topic
Silicon and Solar Cell Technologies
Type
article
Field-Weighted Citation Impact
0.00
Controls
|||
ALL TIME
JAN
FEB
MAR
APR
MAY
JUN
JUL
AUG
SEP
OCT
article

Correction to “Hydrogenation Strategy for Al2O3/MoOx Passivating Contact in High‐Efficiency Crystalline Silicon Solar Cells”

Shaojuan Bao, Shan‐Ting Zhang, Dongdong Li, Siyi Liu et al.
Solar RRL
Silicon and Solar Cell Technologies
article

Correction to “Hydrogenation Strategy for Al2O3/MoOx Passivating Contact in High‐Efficiency Crystalline Silicon Solar Cells”

Shaojuan Bao, Shan‐Ting Zhang, Dongdong Li, Siyi Liu, Jilei Wang, Yanhao Wang, Tian Li, Shihua Huang, Yuner Luo
article en

Abstract

In paragraph 3 of the "Results and Discussion" section, the text "The Q f value for H*-Al 2 O 3 films was -4.74 10 12 cm -2 , higher than the values for H-Al 2 O 3 (-4.63 10 12 cm -2 ), Al 2 O 3 (-4.5 10 12 cm -2 ), and H*-Al 2 O 3 (O 3 ) (-4.41 10 12 cm -2 )." was incorrect.This should have read: "The Q f value for H*-Al 2 O 3 films was -2.45 10 10 cm -2 , higher than the values for H-Al 2 O 3 (-1.64 10 10 cm -2 ), Al 2 O 3 (-1.08 10 10 cm -2 ), and H*-Al 2 O 3 (O 3 ) (-9.6 10 9 cm -2 )."In Note S1 of "Supporting Information", the text "From formula 1, we can obtain the Q f of Al 2 O 3 which equals to -4.5 10 12 cm -2 based on the V fb = 1.21 V and the oxide capacitance C ox = 7.47 10 -12 F. The Q f of H-Al 2 O 3 film calculated from the V fb = 1.32 V and the oxide capacitance C ox = 7.3 10 -12 F is -4.63 10 12 cm -2 .The Q f of H*-Al 2 O 3 film calculated from the V fb = 1.18 V and the oxide capacitance C ox = 7.98 10 -12 F is -4.74 10 12 cm -2 .And the Q f of H*-Al 2 O 3 (O 3 ) film calculated from the V fb = 1.31V and the oxide capacitance C ox = 6.98 10 -12 F is -4.41 10 12 cm -2 " was incorrect.This should have read: "From formula 1, we can obtain the Q f of Al 2 O 3 which equals to -1.08 10 10 cm -2 based on the V fb = -0.6V and the oxide capacitance C ox = 2.58 10 -11 F. The Q f of H-Al 2 O 3 film calculated from the V fb = -0.63V and the oxide capacitance C ox = 2.89 10 -11 F is -1.64 10 10 cm -2 .The Q f of H*-Al 2 O 3 film calculated from the V fb = 0.63 V and the oxide capacitance C ox = 3 10 -11 F is -2.45 10 10 cm -2 .And the Q f of H*-Al 2 O 3 (O 3 ) film calculated from the V fb = -0.57V and the oxide capacitance C ox = 2.81 10 -11 F is -9.6 10 9 cm -2 ."The authors also admitted to an image compilation error in Figure 2b and were able to provide the original image.The erroneous C-V curves on the p-Si MOS structure in our manuscript were due to an incorrect polarity connection, which also caused an erroneous extraction of the flat-band voltage.The authors confirm that all the experimental results and corresponding conclusions mentioned in the paper remain unaffected.The corrected Figure 2b is shown as follows.

Solar RRLVol. 9(6)
Affordable and clean energy
Openalex Percentile: Top 98%
Silicon and Solar Cell Technologies
AI Navigator

Ask Laika to Summarize, Analyze, and Connect papers live on the map.

Summarize Papers & Methodologies

Extract key findings, datasets, and comparative methods across publications.

Benchmark Rankings & Visual Analytics

Rank top research institutions, authors, funders, topics, and journals by Field-Weighted Citation Impact (FWCI) and paper volume with instant charts.

Connect Distant Disciplines

Bridge topological clusters on the map to find hidden collaborative intersections.