Yield Analysis in Semiconductor Manufacturing: Techniques, Case Studies, and Future Direction
Introduction: This paper aims to provide a comprehensive overview of yield analysis techniques, applications, and future directions in semiconductor manufacturing, highlighting their significance in improving productivity, quality, and competitiveness. Objective: The scope of this paper includes Techniques Line yield, Die yield, Pareto yield, Functional yield, Parametric yield, Wafer Sort, Fishbone Diagrams, Scatter Plot, Regression Analysis, and Fault Tree Analysis. Methods: The paper mainly focused on the examination of yield analysis in semiconductor manufacturing, including defect reduction, process optimization, and product quality improvement. Result: The comprehensive analysis gives an in-depth analysis of yield analysis techniques strengths, weaknesses, opportunities, and threats (SWOT analysis) and their applications. Conclusion: Future Research Directions are opportunities for improving yield analysis techniques and their applications.
Authors
- Namrata P Khope
Publication Details
- Journal
- Journal of Information Systems Engineering & Management
- Published
- 2025-02-18
- DOI
- https://doi.org/10.52783/jisem.v10i11s.1515
- Primary Topic
- Industrial Vision Systems and Defect Detection
- Type
- article
- Field-Weighted Citation Impact
- 0.00