High-peak-power 2.1  µm femtosecond holmium amplifier at 100  kHz

High-power ultrafast laser sources in the short-wave infrared region are of great interest for numerous applications, including secondary sources of radiation and processing of materials commonly opaque in the near-infrared region. In this wavelength region, direct laser amplification around 2.1 µm wavelength within the atmospheric transparency window is particularly attractive for realizing compact and efficient high-power lasers. However, this wavelength region was widely underrepresented in femtosecond laser technology so far. Here, we report on a 2.1 µm laser system delivering 97 fs pulses with an unprecedented combination of high peak power of 525 MW and high repetition rate of 100 kHz. The amplifier system consists of a mode-locked oscillator seeding a regenerative amplifier (RA) using the broadband material holmium (Ho)-doped CaAlGdO 4 (CALGO), operating in the chirped pulse amplification (CPA) scheme and a nonlinear compression stage based on a Herriott-type multi-pass cell (MPC) with bulk material. We demonstrate the potential of this laser system by generating a microplasma in ambient air, demonstrating its high intensity for future plasma-driven secondary sources. This system bridges the gap between conventional 1-to-10 kHz amplifiers and high-power MHz laser oscillators in this attractive wavelength range.