Displacement Damage Correlation of Heavy Ion, Proton, and Electron Irradiation in GaAs MESFETs
In this article, we mainly report the radiation response of n-channel depletion-mode gallium arsenide (GaAs) metal-semiconductor field-effect transistors (MESFETs) under heavy ion, proton, and electron irradiation. The maximum transconductance (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${G} _{\text {MAX}}$ </tex-math></inline-formula>) and drain saturation current (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${I} _{\text {DSS}}$ </tex-math></inline-formula>), which can reflect the carrier removal and mobility degradation induced by displacement damage, are selected as evaluation indicators, and two kinds of damage factors are derived: <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${K} _{G}$ </tex-math></inline-formula> and <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${K} _{I}$ </tex-math></inline-formula>. The nonionizing energy loss (NIEL) of different particles deposited in the epitaxial channel layer of GaAs MESFETs is calculated and used to correlate <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${K} _{G}$ </tex-math></inline-formula> and <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${K} _{I}$ </tex-math></inline-formula>, respectively. The good linear relationship between damage factors and NIEL makes it possible to predict the degradation of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${G} _{\text {MAX}}$ </tex-math></inline-formula> and <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${I} _{\text {DSS}}$ </tex-math></inline-formula>. On this basis, two semiempirical damage equations describing GaAs MESFETs displacement damage are derived and verified by 27-MeV F. We also derive the damage coefficient “<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\gamma $ </tex-math></inline-formula>” in the more general damage equation, which has a value of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$5.5\times 10^{-13}$ </tex-math></inline-formula> g/MeV for <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${G} _{\text {MAX}}$ </tex-math></inline-formula> and <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$8.9\times 10^{-13}$ </tex-math></inline-formula> g/MeV for <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${I} _{\text {DSS}}$ </tex-math></inline-formula>. Besides, MESFETs made from other materials may also align with the damage equation. A single irradiation experiment can determine the damage coefficient <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\gamma $ </tex-math></inline-formula> values in principle. This work extends the application of the NIEL-based displacement damage dose (DDD) method in GaAs MESFETs.
Authors
- Xingji Li (ORCID: https://orcid.org/0000-0002-3319-4521)
- Enhao Guan
- Shuhao Hou (ORCID: https://orcid.org/0000-0002-7953-2602)
- Guojian Shao (ORCID: https://orcid.org/0000-0003-3433-2946)
- Zhongli Liu (ORCID: https://orcid.org/0000-0002-3234-310X)
- Gang Lin (ORCID: https://orcid.org/0000-0002-8989-3647)
- Yubao Zhang (ORCID: https://orcid.org/0000-0002-1421-4072)
- Jicheng Jiang
- Shangli Dong
- Jianqun Yang (ORCID: https://orcid.org/0009-0002-4488-1949)
Institutions
- Harbin Institute of Technology (CN)
- Nanjing Institute of Technology (CN)
- Sany (China) (CN)
Publication Details
- Journal
- IEEE Transactions on Nuclear Science
- Published
- 2025-02-18
- DOI
- https://doi.org/10.1109/tns.2025.3543451
- Citations
- 3
- Primary Topic
- Semiconductor materials and devices
- Type
- article
- Field-Weighted Citation Impact
- 2.19