Low Capacitance and Fast Response SCR for High-Speed I/O ESD Protections

A floating-base N-type transistor triggered silicon-controlled rectifier (FBNTSCR) device is developed for high-speed I/O electrostatic discharge (ESD) protection. The device, constructed by embedding a floating-base N-type transistor as the trigger element replacing the P-well tie in a standard SCR, enables the embedded bipolar to be avalanched at the collector-emitter breakdown voltage, providing a lower trigger voltage than the conventional LVTSCR. Furthermore, a lower parasitic capacitance is achieved by mitigating the capacitance associated with the N-well/P-well junction. The proposed design also has a shorter inherent SCR path, resulting in lower on-resistance, higher failure current (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$l_{{t}{2}}$ </tex-math></inline-formula>) and lower overshoot voltage as well as faster turn on speed, all of which benefit the CDM ESD protection performance. Measurement results show the FBNTSCR has ~40.8% reduced trigger voltage, ~68.9% reduced parasitic capacitance and ~16.7% enhanced <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$l_{{t}{2}}$ </tex-math></inline-formula> compared to the conventional LVTSCR.

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Publication Details

Journal
IEEE Electron Device Letters
Published
2025-02-18
DOI
https://doi.org/10.1109/led.2025.3542844
Citations
4
Primary Topic
Electrostatic Discharge in Electronics
Type
article
Field-Weighted Citation Impact
2.92

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article

Low Capacitance and Fast Response SCR for High-Speed I/O ESD Protections

Zhangming Zhu, Feibo Du, Ruibo Chen, Zhiwei Liu et al.
4 citations
IEEE Electron Device Letters
Electrostatic Discharge in Electronics
2.92
article

Low Capacitance and Fast Response SCR for High-Speed I/O ESD Protections

Zhangming Zhu, Feibo Du, Ruibo Chen, Zhiwei Liu, Lu Li
article en
4 citations

Abstract

A floating-base N-type transistor triggered silicon-controlled rectifier (FBNTSCR) device is developed for high-speed I/O electrostatic discharge (ESD) protection. The device, constructed by embedding a floating-base N-type transistor as the trigger element replacing the P-well tie in a standard SCR, enables the embedded bipolar to be avalanched at the collector-emitter breakdown voltage, providing a lower trigger voltage than the conventional LVTSCR. Furthermore, a lower parasitic capacitance is achieved by mitigating the capacitance associated with the N-well/P-well junction. The proposed design also has a shorter inherent SCR path, resulting in lower on-resistance, higher failure current (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$l_{{t}{2}}$ </tex-math></inline-formula>) and lower overshoot voltage as well as faster turn on speed, all of which benefit the CDM ESD protection performance. Measurement results show the FBNTSCR has ~40.8% reduced trigger voltage, ~68.9% reduced parasitic capacitance and ~16.7% enhanced <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$l_{{t}{2}}$ </tex-math></inline-formula> compared to the conventional LVTSCR.

IEEE Electron Device LettersVol. 46(4)
Xidian University (CN), University of Electronic Science and Technology of China (CN)
National Natural Science Foundation of China
Affordable and clean energy
Openalex Percentile: Top 10%
Electrostatic Discharge in Electronics
2.92
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Low Capacitance and Fast Response SCR for High-Speed I/O ESD Protections — Zhangming Zhu, Feibo Du, et al. · IEEE Electron Device Letters (2025) | TGRS Research Map | TGRS