IC SEM Reverse Engineering Tutorial Using Artificial Intelligence
Editor’s notes: Reverse engineering modern complex integrated circuits (ICs) relies on extracting as much helpful information as possible, which requires extensive imaging technology support. One of the key imaging methods, scanning electron microscopy (SEM), offers macroscale resolution values and a wide range of magnification. This tutorial shows how artificial intelligence (AI) techniques facilitate reverse engineering of an IC based on SEM. —Umit Ogras, University of Wisconsin, USA
Authors
- Domenic Forte (ORCID: https://orcid.org/0000-0002-2794-7320)
- Olivia P. Dizon-Paradis (ORCID: https://orcid.org/0000-0002-6879-8624)
- Damon L. Woodard (ORCID: https://orcid.org/0000-0002-0471-177X)
- David S. Koblah (ORCID: https://orcid.org/0000-0002-5208-9874)
- Ronald S. Wilson (ORCID: https://orcid.org/0000-0001-6169-434X)
Institutions
- University of Florida (US)
Publication Details
- Journal
- IEEE Design and Test
- Published
- 2025-02-18
- DOI
- https://doi.org/10.1109/mdat.2025.3543464
- Primary Topic
- Manufacturing Process and Optimization
- Type
- article
- Field-Weighted Citation Impact
- 0.00