Interfacial bottom-up fabrication of ultrathin nanoporous films: techniques, characterization and applications
Abstract The bottom-up fabrication technique is one of the key technologies taking place in conventional top-down approaches to create nanoporous (NP) thin film materials with tailorable nanostructures such as film thickness, film density, pore form, and pore size with nanometer (or sub-nanometer)-scale accuracy. This progress review specifically highlights bottom-up fabrication techniques using two-phase interfaces including solid–gas interfaces, solid–liquid interfaces, liquid–liquid interfaces, and gas–liquid interfaces by referring to recent publications. Moreover, experimental techniques to analyze nanostructures of NP thin film materials from well-ordered regular structures to non-periodic structures are introduced. Finally, some emerging potential applications and future perspectives of NP thin film materials are mentioned by using the latest literature.
Authors
- Yuya Ishizaki (ORCID: https://orcid.org/0000-0002-1243-0441)
- S. Yamamoto (ORCID: https://orcid.org/0000-0002-6854-2477)
- Masaya Mitsuishi (ORCID: https://orcid.org/0000-0002-7069-9860)
- Shusaku Nagano (ORCID: https://orcid.org/0000-0002-3929-6377)
Institutions
- Rikkyo University (JP)
- Tohoku University (JP)
- Kyoto University (JP)
Publication Details
- Journal
- Japanese Journal of Applied Physics
- Published
- 2025-02-18
- DOI
- https://doi.org/10.35848/1347-4065/adb75a
- Citations
- 1
- Primary Topic
- Anodic Oxide Films and Nanostructures
- Type
- article
- Field-Weighted Citation Impact
- 0.52