Giant second harmonic generation in two-dimensional tellurene with synthesis and thickness engineering

Second harmonic generation (SHG) is a prominent branch of non-linear optics (NLO) heavily reliant on conventional bulk NLO crystals. However, the difficulty in downsizing these crystals imposes technical limitations on the future of miniaturized NLO devices. Tellurene emerges as a promising candidate to overcome these restrictions, excelling in electrical applications and believed to possess a giant second-order optical susceptibility comparable to conventional NLO crystals. In this study, a face-to-face substrate configuration is employed for the synthesis of ultrathin tellurene via PVD. Our findings reveal that tellurene's SHG performance surpasses that of monolayer transition metal dichalcogenides by two orders of magnitude, with maximum efficiency when the flake thickness is between 16 and 20 nm under various wavelengths. High sensitivity to thickness variation encourages post-growth thinning through hydrogen plasma etching, enabling precise engineering of the flake thickness for optimal SHG. This establishes a foundation for controlled tellurene thickness, further broadening its potential in diverse applications.

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Publication Details

Journal
Applied Physics Reviews
Published
2025-02-18
DOI
https://doi.org/10.1063/5.0218276
Citations
1
Primary Topic
2D Materials and Applications
Type
article
Field-Weighted Citation Impact
0.52

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article

Giant second harmonic generation in two-dimensional tellurene with synthesis and thickness engineering

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1 citations
Applied Physics Reviews
2D Materials and Applications
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article

Giant second harmonic generation in two-dimensional tellurene with synthesis and thickness engineering

Ahmed Raza Khan, Yuerui Lu, Kun Liang, Boqing Liu, Xueqian Sun, Qingyi Zhou, Zongfu Yu, Tanju Yildirim, Sharidya Rahman, Yun Liu, Zhuoyuan Lu
article en
1 citations

Abstract

Second harmonic generation (SHG) is a prominent branch of non-linear optics (NLO) heavily reliant on conventional bulk NLO crystals. However, the difficulty in downsizing these crystals imposes technical limitations on the future of miniaturized NLO devices. Tellurene emerges as a promising candidate to overcome these restrictions, excelling in electrical applications and believed to possess a giant second-order optical susceptibility comparable to conventional NLO crystals. In this study, a face-to-face substrate configuration is employed for the synthesis of ultrathin tellurene via PVD. Our findings reveal that tellurene's SHG performance surpasses that of monolayer transition metal dichalcogenides by two orders of magnitude, with maximum efficiency when the flake thickness is between 16 and 20 nm under various wavelengths. High sensitivity to thickness variation encourages post-growth thinning through hydrogen plasma etching, enabling precise engineering of the flake thickness for optimal SHG. This establishes a foundation for controlled tellurene thickness, further broadening its potential in diverse applications.

Applied Physics ReviewsVol. 12(1)
Australian National University (AU), University of Wisconsin–Madison (US), University of Engineering and Technology Lahore (PK), National Institute for Materials Science (JP), Centre for Quantum Computation and Communication Technology (AU), Division of Materials Science and Engineering (AU), Monash University (AU)
National Heart Foundation of Australia, Australian Research Council, Centre of Excellence for Quantum Computation and Communication Technology, Australian Research Council
Openalex Percentile: Top 42%
2D Materials and Applications
0.52
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