Metastable Fine Grain Cu for Hybrid Bonding Applications
Utilizing metastable fine-grain copper offers an opportunity to implement low-thermal budget hybrid bonding techniques. We outline several methods for characterizing fine-grain structures and a screening process to refine these structures. Furthermore, we explore the differences in copper grain evolution between blanket and patterned wafers at room temperature. Finally, we introduce metastable fine-grain copper, which demonstrates stability for four weeks of self-annealing and maintains stability through annealing at 150°C for 2 hours, with grain growth occurring at 250°C. The capability to maintain fine-grain copper over an extended period presents a promising solution for low-thermal budget hybrid bonding.
Authors
- Adam Letize
- Elie Najjar
- Thomas Richardson (ORCID: https://orcid.org/0000-0001-7767-452X)
- Veronica Hayes (ORCID: https://orcid.org/0000-0002-1092-1271)
- Harshul S. Khanna (ORCID: https://orcid.org/0000-0001-7120-0462)
- Kyle Whitten
- Abdelhamid M. El‐Sawy (ORCID: https://orcid.org/0000-0002-7019-2031)
- Pingping Ye (ORCID: https://orcid.org/0000-0002-6280-582X)
- Stephan Braye
- Jianwen Han
Publication Details
- Journal
- IMAPSource Proceedings
- Published
- 2025-02-13
- DOI
- https://doi.org/10.4071/001c.129765
- Primary Topic
- 3D IC and TSV technologies
- Type
- article
- Field-Weighted Citation Impact
- 0.00