New Interconnection Technologies Based on Ni Micro-plating Bonding for High-temperature Resistant Power Device Packaging
This study proposes Ni Micro-Plating Bonding (NMPB) as a new bonding method for semiconductor packages for power devices with high heat resistance such as SiC. NMPB enables bonding at low temperatures (55°C) by using nickel plating, a high melting point metal. Bonding was conducted using newly developed Ni plating solution and lead frames with a chevron-shaped profile designed for NMPB, and the strength and microstructure of the bonded area were evaluated. As a result, it was found that bonding with NMPB exhibits stronger bonding strength compared to conventional lead-free solder. Furthermore, the electrical characteristics of power modules connected by NMPB were evaluated, confirming normal operation at both room temperature and high temperature (250°C). Thus, NMPB is suggested as a new high-temperature device-compatible bonding technology applicable to replace conventional bonding techniques.
Authors
- Takumi ONODERA
- Xing Wei (ORCID: https://orcid.org/0000-0002-7544-5122)
- Masayoshi Nakagawa
- Isamu Morisako
- Masakazu Inagaki
- Mayu Miyagawa
- Kohei Tatsumi (ORCID: https://orcid.org/0000-0002-4732-1093)
- Keiko Koshiba
- Tomonori Iizuka
Institutions
- Waseda University (JP)
Publication Details
- Journal
- IMAPSource Proceedings
- Published
- 2025-02-03
- DOI
- https://doi.org/10.4071/001c.129277
- Primary Topic
- Electronic Packaging and Soldering Technologies
- Type
- article
- Field-Weighted Citation Impact
- 0.00