Fabrication and Investigation of W/Mg2Si Multilayer X-Ray Mirrors for the 0.9-2.5 nm and 25–35 nm Wavelength Ranges

This study investigates the fabrication and properties of <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\mathbf{W}/\mathbf{Mg_{2}}\mathbf{Si}$</tex> multilayer X-ray mirrors (MXMs) using DC magnetron sputtering. <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\mathbf{W}/\mathbf{Mg_{2}}\mathbf{Si}$</tex> MXMs with a period of about 3 nm were grown and characterised by X-ray reflectivity (XRR) and electron microscopy. The interlayer boundaries exhibited a roughness of ~0.3 nm, suitable for mirrors with such fine periods. During fabrication, interlayer interactions resulted in formation of a mixed zone at the Mg2Si-on-W interface within the tungsten layer. The composition of this mixed zone varied with layer thickness. Experimental XRR patterns showed mixed zone densities of <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\boldsymbol{16.1}\mathbf{g}/\mathbf{cm^{3}}$</tex> for a period of 3.1 nm and <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\boldsymbol{3.2}\mathbf{g}/\mathbf{cm^{3}}$</tex> for a period of 14.2 nm. Reflectivity measurements at <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\mathbf{Mg}-\mathbf{K}\boldsymbol{\alpha}$</tex> (9.89 nm) showed that the unoptimised <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\mathbf{W}/\mathbf{Mg_{2}}$</tex> Si MXM performed comparably to <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\mathbf{W}/\mathbf{B}_{4}\mathbf{C}$</tex> MXMs, with a 5% advantage at <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\mathbf{Na}-\mathbf{K}\boldsymbol{\alpha}$</tex> (1.191 nm). These results highlight the potential of short period <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\mathbf{W}/\mathbf{Mg2}$</tex> Si MXMs in X-ray spectral analysis for the detection of elements such as Mg, Na, F and O.

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Published
2024-10-07
DOI
https://doi.org/10.1109/khpiweek61434.2024.10877978
Primary Topic
Chalcogenide Semiconductor Thin Films
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article
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article

Fabrication and Investigation of W/Mg2Si Multilayer X-Ray Mirrors for the 0.9-2.5 nm and 25–35 nm Wavelength Ranges

А. І. Mikhailov, L. E. Konotopskyi, I. А. Kopylets, S.V. Malykhin et al.
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Chalcogenide Semiconductor Thin Films
article

Fabrication and Investigation of W/Mg2Si Multilayer X-Ray Mirrors for the 0.9-2.5 nm and 25–35 nm Wavelength Ranges

А. І. Mikhailov, L. E. Konotopskyi, I. А. Kopylets, S.V. Malykhin, I. F. Mikhailov, S.V. Surovitskiy, Tetiana Konotopska, Antonina Mayzelis
article en

Abstract

This study investigates the fabrication and properties of <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\mathbf{W}/\mathbf{Mg_{2}}\mathbf{Si}$</tex> multilayer X-ray mirrors (MXMs) using DC magnetron sputtering. <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\mathbf{W}/\mathbf{Mg_{2}}\mathbf{Si}$</tex> MXMs with a period of about 3 nm were grown and characterised by X-ray reflectivity (XRR) and electron microscopy. The interlayer boundaries exhibited a roughness of ~0.3 nm, suitable for mirrors with such fine periods. During fabrication, interlayer interactions resulted in formation of a mixed zone at the Mg2Si-on-W interface within the tungsten layer. The composition of this mixed zone varied with layer thickness. Experimental XRR patterns showed mixed zone densities of <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\boldsymbol{16.1}\mathbf{g}/\mathbf{cm^{3}}$</tex> for a period of 3.1 nm and <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\boldsymbol{3.2}\mathbf{g}/\mathbf{cm^{3}}$</tex> for a period of 14.2 nm. Reflectivity measurements at <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\mathbf{Mg}-\mathbf{K}\boldsymbol{\alpha}$</tex> (9.89 nm) showed that the unoptimised <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\mathbf{W}/\mathbf{Mg_{2}}$</tex> Si MXM performed comparably to <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\mathbf{W}/\mathbf{B}_{4}\mathbf{C}$</tex> MXMs, with a 5% advantage at <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\mathbf{Na}-\mathbf{K}\boldsymbol{\alpha}$</tex> (1.191 nm). These results highlight the potential of short period <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\mathbf{W}/\mathbf{Mg2}$</tex> Si MXMs in X-ray spectral analysis for the detection of elements such as Mg, Na, F and O.

National Technical University "Kharkiv Polytechnic Institute" (UA)
Openalex Percentile: Top 75%
Chalcogenide Semiconductor Thin Films
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