Improved corrosion resistance and electrical characteristics of titanium, with atomic layer deposited (ALD) TiOx coating
• Voltage reduced for Ti anodization at elevated temperature. • ALD TiO x forms an effective oxygen diffusion barrier layer hence to prevent further oxidation of titanium. • ALD TiO x coating reduces corrosion of titanium in PEM electrolyzers at low pH. • Five orders of magnitude increase in current density with ALD TiO x -coated titanium. Titanium (Ti), widely used in proton exchange membrane (PEM) based water electrolyzers, is prone to oxidation and related corrosion given the high operating voltages (>2 V) and low pH (⩽5) conditions. Here, it is shown that a thin layer of ALD (atomic layer deposition) TiO x can serve as a barrier for drastically reducing the corrosion of Ti. The robustness of the coatings was evaluated at high potentials (2.4 V vs. RHE – reversible hydrogen electrode), in low pH and at elevated temperature (80 °C). A low TiO x dissolution rate (<∼5 nm year −1 ) along with five orders of magnitude enhanced current density, was observed for the ALD TiO x coated Ti compared to uncoated Ti.
Authors
- SeongUk Yun (ORCID: https://orcid.org/0000-0002-1821-6753)
- Andrew C. Kummel (ORCID: https://orcid.org/0000-0001-8301-9855)
- Prabhakar R. Bandaru (ORCID: https://orcid.org/0000-0003-4497-9620)
- Kesong Wang (ORCID: https://orcid.org/0000-0002-3457-8631)
- Ping‐Che Lee (ORCID: https://orcid.org/0000-0002-6480-0037)
- Ahmet Gün Erlat
- Adam Paxson
- Thomas Valdez
Institutions
- Latham & Watkins (United States) (US)
- University of California San Diego (US)
Publication Details
- Journal
- Applied Surface Science
- Published
- 2025-02-18
- DOI
- https://doi.org/10.1016/j.apsusc.2025.162719
- Citations
- 7
- Primary Topic
- Metal and Thin Film Mechanics
- Type
- article
- Field-Weighted Citation Impact
- 6.05