An Integrated Closed Loop Flowsheet for Production of Highly Enriched 63Ni and Deposition of 63Ni Coatings

Abstract The existing technologies for the production, separation, and purification of 63 Ni, as well as methods for the deposition of nickel coatings to fabricate a betavoltaic nuclear battery have been reviewed. A new integrated closed loop flowsheet for the production of highly enriched 63 Ni and deposition of 63 Ni coatings using a single reagent, phosphorus trifluoride (PF 3 ), in all stages of the process is proposed. The use of tetrakis(trifluorophosphine)nickel [Ni(PF 3 ) 4 ] allows isotopic enrichment of 62 Ni and 63 Ni, purification of irradiated Ni from radioactive impurities, and deposition of highly enriched 63 Ni onto a semiconductor substrate. The proposed flowsheet allows the amount of the liquid radioactive waste generated during isotope purification and coating deposition to be reduced as compared to traditional “wet” chemistry methods.

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Publication Details

Journal
Radiochemistry
Published
2024-12-01
DOI
https://doi.org/10.1134/s1066362224060018
Citations
1
Primary Topic
Radioactive contamination and transfer
Type
article
Field-Weighted Citation Impact
0.28
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article

An Integrated Closed Loop Flowsheet for Production of Highly Enriched 63Ni and Deposition of 63Ni Coatings

M. Yu. Alyapyshev, V. A. Mazgunova, В. А. Бабаин, A. I. Kostylev
1 citations
Radiochemistry
Radioactive contamination and transfer
0.28
article

An Integrated Closed Loop Flowsheet for Production of Highly Enriched 63Ni and Deposition of 63Ni Coatings

M. Yu. Alyapyshev, V. A. Mazgunova, В. А. Бабаин, A. I. Kostylev
article en
1 citations

Abstract

Abstract The existing technologies for the production, separation, and purification of 63 Ni, as well as methods for the deposition of nickel coatings to fabricate a betavoltaic nuclear battery have been reviewed. A new integrated closed loop flowsheet for the production of highly enriched 63 Ni and deposition of 63 Ni coatings using a single reagent, phosphorus trifluoride (PF 3 ), in all stages of the process is proposed. The use of tetrakis(trifluorophosphine)nickel [Ni(PF 3 ) 4 ] allows isotopic enrichment of 62 Ni and 63 Ni, purification of irradiated Ni from radioactive impurities, and deposition of highly enriched 63 Ni onto a semiconductor substrate. The proposed flowsheet allows the amount of the liquid radioactive waste generated during isotope purification and coating deposition to be reduced as compared to traditional “wet” chemistry methods.

RadiochemistryVol. 66(6)
V. G. Khlopin Radium Institute (RU), St. Petersburg State Medical Academy "City Polyclinic №44" (RU), Optolink (Russia) (RU)
Openalex Percentile: Top 39%
Radioactive contamination and transfer
0.28
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