Improving the thermoelectric performance of scandium nitride thin films by implanting helium ions
Abstract Ion implantation is a widely used technique to introduce defects in low-dimensional materials and tune their properties. Here, we investigate the thermoelectric properties of scandium nitride thin films implanted with helium ions, revealing a positive impact of defect engineering on thermoelectric performance. Transport properties modeling and electron microscopy provide insights on the defect distribution in the films. The electrical resistivity and Seebeck coefficient increase significantly in absolute values after implantation and partially recover upon annealing as some of the implantation-induced defects heal. The thermal conductivity decreases by 46 % post- implantation due to the formation of extended defects and nanocavities. Consequently, the thermoelectric figure of merit zT doubles for the sample annealed at 673 K. These findings highlight the potential of controlled ion implantation to enhance thermoelectric properties in thin films, paving the way for further optimization through defect engineering.
Authors
- Fabien Giovannelli (ORCID: https://orcid.org/0000-0003-1248-077X)
- Johan Nyman (ORCID: https://orcid.org/0000-0003-0487-4680)
- Razvan Burcea (ORCID: https://orcid.org/0000-0002-6453-8921)
- Per Eklund (ORCID: https://orcid.org/0000-0003-1785-0864)
- Danièle Fournier (ORCID: https://orcid.org/0000-0001-5485-3381)
- Hugo Bouteiller (ORCID: https://orcid.org/0009-0004-2132-2962)
- S. Dubois (ORCID: https://orcid.org/0000-0003-1881-7185)
- Arnaud le Febvrier (ORCID: https://orcid.org/0000-0002-3059-7392)
- Younès Ezzahri (ORCID: https://orcid.org/0000-0001-7036-4377)
- J. F. Barbot
- Charlotte Poterie (ORCID: https://orcid.org/0009-0007-2964-5098)
Institutions
- Linköping University (SE)
- Université de Tours (FR)
- Uppsala University (SE)
- Centre National de la Recherche Scientifique (FR)
- National Institute for Materials Science (JP)
- Université Paris-Saclay (FR)
- Institut Pprime (FR)
- Sorbonne Université (FR)
- CentraleSupélec (FR)
- Thion Medical (France) (FR)
- Institut des NanoSciences de Paris (FR)
- Laboratoire de Cristallographie et Sciences des Matériaux (FR)
- LINK - Laboratory for Innovative Key Materials and Structures
Publication Details
- Journal
- Communications Materials
- Published
- 2025-02-15
- DOI
- https://doi.org/10.1038/s43246-025-00741-2
- Citations
- 4
- Primary Topic
- Advanced Thermoelectric Materials and Devices
- Type
- article
- Field-Weighted Citation Impact
- 2.07
Funders
- Agence Nationale de la Recherche
- Knut och Alice Wallenbergs Stiftelse
- Vetenskapsrådet
- Energimyndigheten