DC Analysis of Symmetrical and Asymmetrical T Gate AIGaN/GaN Based HEMT

A Symmetrical and an Asymmetrical T-shaped gate AIGaN/GaN based High Electron Mobility Transistor (HEMT) characterized by a gate length of 100 nm have been conceptualized and subjected to comparative analysis. The DC analysis conducted on both structures indicates an enhancement in drain current for the Asymmetrical T-gate HEMT; however, the Symmetrical T-gate HEMT configuration demonstrates superior threshold voltage characteristics. Asymmetrical T gate HEMT shows higher Transconductance than its Symmetrical counterpart. Output conductance is low for Symmetrical T gate HEMT. Hence with higher Transconductance an Asymmetrical AIGaN/GaN based HEMT is a promising design for RF application in microwave devices.

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Publication Details

Published
2024-11-29
DOI
https://doi.org/10.1109/aespc63931.2024.10872199
Primary Topic
GaN-based semiconductor devices and materials
Type
article
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article

DC Analysis of Symmetrical and Asymmetrical T Gate AIGaN/GaN Based HEMT

Manasa Ranjan Jena, Lipsamayee Mishra
GaN-based semiconductor devices and materials
article

DC Analysis of Symmetrical and Asymmetrical T Gate AIGaN/GaN Based HEMT

Manasa Ranjan Jena, Lipsamayee Mishra
article en

Abstract

A Symmetrical and an Asymmetrical T-shaped gate AIGaN/GaN based High Electron Mobility Transistor (HEMT) characterized by a gate length of 100 nm have been conceptualized and subjected to comparative analysis. The DC analysis conducted on both structures indicates an enhancement in drain current for the Asymmetrical T-gate HEMT; however, the Symmetrical T-gate HEMT configuration demonstrates superior threshold voltage characteristics. Asymmetrical T gate HEMT shows higher Transconductance than its Symmetrical counterpart. Output conductance is low for Symmetrical T gate HEMT. Hence with higher Transconductance an Asymmetrical AIGaN/GaN based HEMT is a promising design for RF application in microwave devices.

Veer Surendra Sai University of Technology (IN)
Openalex Percentile: Top 84%
GaN-based semiconductor devices and materials
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