Design Specification and Performance Analysis of Core-Shell $In_{1-x}Ga_{x}\text{As}$ FinFET

This work presents a comparison study of silicon core-shell FinFET and Bulk InGaAs FinFET using a well-calibrated numerical simulation framework. We thoroughly an-alyzed crucial parameters like subthreshold swing (SS), drain-induced barrier lowering (DIBL), switching ratio, drive current, transconductance, transconductance efficiency, and various RF metrics for both devices. Due to the introduction of the Silicon core, the core-shell structure shows better electrostatics integrity in terms of reduced short-channel effects and leakage current. A substantial enhancement in the switching ratio has been observed. Also, due to the improved electrostatic integrity, improvement in analog figure of merits is observed. However, RF performance of the device degrades due to enhanced gate capacitace.

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Published
2024-11-29
DOI
https://doi.org/10.1109/aespc63931.2024.10872375
Citations
1
Primary Topic
Advancements in Semiconductor Devices and Circuit Design
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article
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article

Design Specification and Performance Analysis of Core-Shell $In_{1-x}Ga_{x}\text{As}$ FinFET

Subir Kumar Maity, Rajendra Prasad, Rubel Khan, Raj Saha et al.
1 citations
Advancements in Semiconductor Devices and Circuit Design
0.21
article

Design Specification and Performance Analysis of Core-Shell $In_{1-x}Ga_{x}\text{As}$ FinFET

Subir Kumar Maity, Rajendra Prasad, Rubel Khan, Raj Saha, Soujit Chel, Debdyuti Maji
article en
1 citations

Abstract

This work presents a comparison study of silicon core-shell FinFET and Bulk InGaAs FinFET using a well-calibrated numerical simulation framework. We thoroughly an-alyzed crucial parameters like subthreshold swing (SS), drain-induced barrier lowering (DIBL), switching ratio, drive current, transconductance, transconductance efficiency, and various RF metrics for both devices. Due to the introduction of the Silicon core, the core-shell structure shows better electrostatics integrity in terms of reduced short-channel effects and leakage current. A substantial enhancement in the switching ratio has been observed. Also, due to the improved electrostatic integrity, improvement in analog figure of merits is observed. However, RF performance of the device degrades due to enhanced gate capacitace.

KIIT University (IN)
Openalex Percentile: Top 44%
Advancements in Semiconductor Devices and Circuit Design
0.21
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Design Specification and Performance Analysis of Core-Shell $In_{1-x}Ga_{x}\text{As}$ FinFET — Subir Kumar Maity, Rajendra Prasad, et al. · (2024) | TGRS Research Map | TGRS