Optimized characterization methods for nanoimprinted pillar arrays on 200 mm wafers: Application to μLEDs

Authors

Pierre‐Marie Coulon (ORCID: https://orcid.org/0000-0002-9120-7554)
N. Labchir (ORCID: https://orcid.org/0000-0002-3959-1018)
Jérôme Rêche (ORCID: https://orcid.org/0000-0001-7201-2682)
J.H. Tortai (ORCID: https://orcid.org/0000-0002-8460-4703)
C. Gourgon (ORCID: https://orcid.org/0009-0001-5803-2115)
Camille Petit‐Etienne (ORCID: https://orcid.org/0000-0003-4199-5529)
Maya Wehbe (ORCID: https://orcid.org/0000-0002-8120-2506)
Blandine Alloing (ORCID: https://orcid.org/0009-0008-0923-3616)
Matthew Charles (ORCID: https://orcid.org/0000-0003-0668-8865)
Marc Rabarot

Institutions

Institut polytechnique de Grenoble (FR)
Commissariat à l'Énergie Atomique et aux Énergies Alternatives (FR)
CEA Grenoble (FR)
Centre de Recherche sur l'Hétéro-Epitaxie et ses Applications (FR)
Laboratoire des Technologies de la Microélectronique (FR)
Laboratoire d'Électronique des Technologies de l'Information (FR)
École Polytechnique Fédérale de Lausanne (CH)

Publication Details

Journal: SPIRE - Sciences Po Institutional REpository
Published: 2024-11-12
Primary Topic: Nanofabrication and Lithography Techniques
Type: article
Field-Weighted Citation Impact: 0.00

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article

Optimized characterization methods for nanoimprinted pillar arrays on 200 mm wafers: Application to μLEDs

Pierre‐Marie Coulon, N. Labchir, Jérôme Rêche, J.H. Tortai et al.

Nov 12, 2024

SPIRE - Sciences Po Institutional REpository

Nanofabrication and Lithography Techniques

article

Optimized characterization methods for nanoimprinted pillar arrays on 200 mm wafers: Application to μLEDs

Pierre‐Marie Coulon, N. Labchir, Jérôme Rêche, J.H. Tortai, C. Gourgon, Camille Petit‐Etienne, Maya Wehbe, Blandine Alloing, Matthew Charles, Marc Rabarot

November 12, 2024article en

Abstract

No abstract available for this paper.

SPIRE - Sciences Po Institutional REpository

Institut polytechnique de Grenoble (FR), Commissariat à l'Énergie Atomique et aux Énergies Alternatives (FR), CEA Grenoble (FR), Centre de Recherche sur l'Hétéro-Epitaxie et ses Applications (FR), Laboratoire des Technologies de la Microélectronique (FR), Laboratoire d'Électronique des Technologies de l'Information (FR), École Polytechnique Fédérale de Lausanne (CH)

Openalex Percentile: Top 76%

Nanofabrication and Lithography Techniques

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Optimized characterization methods for nanoimprinted pillar arrays on 200 mm wafers: Application to μLEDs — Pierre‐Marie Coulon, N. Labchir, et al. · SPIRE - Sciences Po Institutional REpository (2024) | TGRS Research Map | TGRS