Surface Energy Tailored Reduced Graphene Oxide Top‐Coat for Vertical Alignment of High‐χ Block Copolymers for Sub‐10‐nm Nanopatterning

Vertically aligned nanopatterns of high Flory-Huggins parameter (χ) block copolymers (BCPs) are desirable for effective pattern transfer of sub-10-nm scale self-assembled morphologies. To this end, BCP thin film is required to interface with neutralized surface energy at both substrate and free-surface, among which neutralization of top free-surface is generally more difficult without well-defined substrate geometry. Therefore, various types of top-coat layers have been developed, many of which, however, require complex synthetic processes or specifically designed equipment. In this work, a surface energy-tailored reduced graphene oxide (rGO) top-coat layer capable of achieving neutral surface conditions for high-χ BCPs is presented. The surface energy of rGO can be precisely controlled by straightforward thermal reduction to attain neutral surface energy conditions for high-χ BCPs. The versatile processability of rGO introduces intriguing features in top-coat layers, facilitating area-selective nanopatterning or multilayer stacked independently self-assembled nanopatterning. Additionally, a large area rGO top-coat layer is successfully implemented on various types of substrate materials, over which directed self-assembly (DSA) of high-χ BCPs can be attained for highly aligned vertical nanopatterns of sub-10-nm scale lamellar morphologies.

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Publication Details

Journal
Small
Published
2025-02-13
DOI
https://doi.org/10.1002/smll.202407947
Citations
3
Primary Topic
Block Copolymer Self-Assembly
Type
article
Field-Weighted Citation Impact
1.55
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article

Surface Energy Tailored Reduced Graphene Oxide Top‐Coat for Vertical Alignment of High‐χ Block Copolymers for Sub‐10‐nm Nanopatterning

Jang Hwan Kim, Dongjiang You, Hyeong Min Jin, Sang Ouk Kim et al.
3 citations
Small
Block Copolymer Self-Assembly
1.55
article

Surface Energy Tailored Reduced Graphene Oxide Top‐Coat for Vertical Alignment of High‐χ Block Copolymers for Sub‐10‐nm Nanopatterning

Jang Hwan Kim, Dongjiang You, Hyeong Min Jin, Sang Ouk Kim, Kyu Hyo Han, Geon Gug Yang, In Ho Kim, Jin Goo Kim, Chan Woo Lee, Hee Jae Choi
article en
3 citations

Abstract

Vertically aligned nanopatterns of high Flory-Huggins parameter (χ) block copolymers (BCPs) are desirable for effective pattern transfer of sub-10-nm scale self-assembled morphologies. To this end, BCP thin film is required to interface with neutralized surface energy at both substrate and free-surface, among which neutralization of top free-surface is generally more difficult without well-defined substrate geometry. Therefore, various types of top-coat layers have been developed, many of which, however, require complex synthetic processes or specifically designed equipment. In this work, a surface energy-tailored reduced graphene oxide (rGO) top-coat layer capable of achieving neutral surface conditions for high-χ BCPs is presented. The surface energy of rGO can be precisely controlled by straightforward thermal reduction to attain neutral surface energy conditions for high-χ BCPs. The versatile processability of rGO introduces intriguing features in top-coat layers, facilitating area-selective nanopatterning or multilayer stacked independently self-assembled nanopatterning. Additionally, a large area rGO top-coat layer is successfully implemented on various types of substrate materials, over which directed self-assembly (DSA) of high-χ BCPs can be attained for highly aligned vertical nanopatterns of sub-10-nm scale lamellar morphologies.

SmallVol. 21(10)
Korea Advanced Institute of Science and Technology (KR), Chungnam National University (KR), Ajou University (KR)
Affordable and clean energy
Openalex Percentile: Top 20%
Block Copolymer Self-Assembly
1.55
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Surface Energy Tailored Reduced Graphene Oxide Top‐Coat for Vertical Alignment of High‐χ Block Copolymers for Sub‐10‐nm Nanopatterning — Jang Hwan Kim, Dongjiang You, et al. · Small (2025) | TGRS Research Map | TGRS